Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.56 |
| ▸ | CES1 | P23141 | 1/20 | 0.56 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.48 |
| ▸ | POLB | P06746 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | RECQL | P46063 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | APEX1 | P27695 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.43 |
| ▸ | NPC1 | O15118 | 2/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | ERCC5 | P28715 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13656481 | 0.82 | CES2 (0.56) | CES2CES1PTPN1ALDH1A1POLB | |
| SCHEMBL146130 | 0.81 | PTPN1 (0.63) | CES2CES1PTPN1ALDH1A1POLB | |
| SCHEMBL23069153 | 0.81 | CES2 (0.58) | CES2CES1PTPN1ALDH1A1POLB | |
| SCHEMBL245406 | 0.79 | CES2 (0.56) | CES2CES1PTPN1ALDH1A1POLB | |
| Hydrochloric Acid SCHEMBL6744118 | 0.79 | PTPN1 (0.61) | CES2CES1PTPN1ALDH1A1POLB | |
| SCHEMBL1553449 | 0.78 | CES2 (0.74) | CES2CES1PTPN1ALDH1A1POLB | |
| SCHEMBL109405 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL4129676 | 0.76 | — | — | |
| SCHEMBL27292956 | 0.76 | — | — | |
| SCHEMBL2029061 | 0.75 | CES2 (0.55) | CES2CES1PTPN1ALDH1A1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0567379-B1 | Photochemically crosslinked material for non-linear optical application | THOMSON CSF (FR) | 1997-07-23 | — | — | EP | claimed |
| JP-56122030-A | — | — | None | — | — | JP | disclosed |
| CN-114573502-B | Pleuromutilin aromatic heterocyclic acrylate compound, and synthetic method and application thereof | 西安康远晟生物医药科技有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-114507211-B | Preparation method of 2, 3-naphthalimide derivative | 华中科技大学 | 2023-03-10 | — | — | CN | disclosed |
| CN-114573502-A | Pleuromutilin aromatic heterocyclic acrylate compounds and synthesis method and application thereof | 西安康远晟生物医药科技有限公司 | 2022-06-03 | — | — | CN | disclosed |
| CN-114507211-A | Preparation method of 2, 3-naphthalimide derivative | 华中科技大学 | 2022-05-17 | — | — | CN | disclosed |
| CN-109928967-B | Cyclized berberine derivative and preparation method and application thereof | 中国医学科学院医药生物技术研究所 | 2020-09-04 | — | — | CN | disclosed |
| US-7396898-B2 | Diamine, acid dianhydride, and reactive group containing polyimide composition prepared therefrom and process of preparing them | KANEKA CORPORATION (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20040158030-A1 | Diamine, acid dianhydride, polymide composition having reactive group obtained therefrom, and processes for producing these | KANEKA CORPORATION (JP) | 2004-08-12 | — | — | US | disclosed |
| US-6307002-B1 | POLYIMIDES FROM TETRAACIDS AND DIAMINES | KANEKA CORPORATION (JP) | 2001-10-23 | — | — | US | disclosed |
| US-5496899-A | Crosslinkable polymer material which may be used in non-linear optics and process for obtaining it | FRANCE TELECOM (FR) | 1996-03-05 | — | — | US | disclosed |
| EP-0189774-B1 | PROCESS FOR PRODUCTION OF N,N-DISUBSTITUTED CARBOXYLIC ACID AMIDES | TOKUYAMA SODA KABUSHIKI KAISHA (JP) | 1989-04-12 | — | — | EP | disclosed |
| US-4759991-A | Substrate, ferromagnetic metal thin film and lubricating coating layer of graft copolymer of silicon and radical polymerizable monomer | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1988-07-26 | — | — | US | disclosed |
| US-4732951-A | Polyether-based photopolymers | SIEMENS AKTIENGESELLSCHAFT (DE) | 1988-03-22 | — | — | US | disclosed |
| EP-0189774-A1 | Process for production of N,N-disubstituted carboxylic acid amides | TOKUYAMA SODA KABUSHIKI KAISHA (JP) | 1986-08-06 | — | — | EP | disclosed |
| JP-S56122030-A | PHOTOSENSITIVE RESIN COMPOSITION DEVELOPABLE WITH AQUEOUS ALKALI SOLUTION | DAICEL CHEM IND LTD | 1981-09-25 | — | — | JP | disclosed |