Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 1/20 | 0.45 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.45 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.45 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | NOS2 | P35228 | 1/20 | 0.32 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15196409 | 1.00 | CHRM2 (0.45) | CHRM2CHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL47236 | 1.00 | CHRM2 (0.45) | CHRM2CHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL5405253 | 0.97 | CHRM2 (0.43) | CHRM2CHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL21841417 | 0.97 | CHRM2 (0.43) | CHRM2CHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL4456368 | 0.97 | CHRM2 (0.43) | CHRM2CHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL3310461 | 0.94 | — | — | |
| SCHEMBL128736 | 0.94 | — | — | |
| SCHEMBL21903169 | 0.94 | CHRM2 (0.40) | CHRM2CHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL17675374 | 0.94 | CHRM2 (0.40) | CHRM2CHRM4CHRM5CHRM1CHRM3 | |
| SCHEMBL9093899 | 0.92 | CHRM2 (0.39) | CHRM2CHRM4CHRM5CHRM1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 180 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2202577-B1 | Chemically amplified positive resist composition and resist patterning process | SHINETSU CHEMICAL CO (JP) | 2014-08-27 | — | — | EP | claimed |
| US-20240118613-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| EP-4336261-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-13 | — | — | EP | disclosed |
| US-20230393470-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-07 | — | — | US | disclosed |
| US-20230393461-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-07 | — | — | US | disclosed |
| US-20230393465-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-07 | — | — | US | disclosed |
| EP-4286943-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-4286946-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-4286944-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-12-06 | — | — | EP | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20050003303-A1 | Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-06 | — | — | US | disclosed |
| EP-1485387-A1 | CARBAMATES AS HIV PROTEASE INHIBITORS | BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) | 2004-12-15 | — | — | EP | disclosed |
| US-20040234884-A1 | Basic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-25 | — | — | US | disclosed |
| US-20040234885-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-25 | — | — | US | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| US-20040039016-A1 | HIV protease inhibitors | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2004-02-26 | — | — | US | disclosed |
| WO-2003078438-A1 | CARBAMATES AS HIV PROTEASE INHIBITORS | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) | 2003-09-25 | — | — | WO | disclosed |
| EP-0250265-B1 | 2-PHENYLBENZOXEPIN DERIVATIVE | SUNTORY LIMITED (JP) | 1990-09-05 | — | — | EP | disclosed |
| US-4845094-A | HYPOGLYCEMIC, ANTICOAGULANT | SUNTORY LIMITED (JP) | 1989-07-04 | — | — | US | disclosed |
| EP-0250265-A1 | 2-Phenylbenzoxepin derivative | SUNTORY LIMITED (JP) | 1987-12-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040039016-A1 | HIV protease inhibitors | SERPINB1, TMPRSS15, DNPEP | CHRM2 4823/4885CHRM4 4688/4885CHRM5 4606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.