SCHEMBL5401050

SCHEMBL5401050

CC(C)(C)[C]1CC2CCC1C2

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6858086 0.76
SCHEMBL21332245 0.67
SCHEMBL482468 0.67
SCHEMBL332928 0.62
SCHEMBL4243811 0.62
SCHEMBL2019477 0.62
SCHEMBL3765297 0.62 SLC6A3 (0.30) SLC6A3
SCHEMBL473655 0.62
SCHEMBL2575530 0.62 SLC6A3 (0.33) SLC6A3
SCHEMBL7599222 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115498132-A Organic electroluminescent device 长春海谱润斯科技股份有限公司 2022-12-20 CN disclosed
US-20120183902-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed