Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 3/20 | 0.73 |
| ▸ | AKR1B10 | O60218 | 2/20 | 0.73 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.73 |
| ▸ | PKM | P14618 | 2/20 | 0.73 |
| ▸ | CA12 | O43570 | 2/20 | 0.73 |
| ▸ | CA1 | P00915 | 2/20 | 0.73 |
| ▸ | CA2 | P00918 | 2/20 | 0.73 |
| ▸ | CA7 | P43166 | 2/20 | 0.73 |
| ▸ | CA9 | Q16790 | 2/20 | 0.73 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.73 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.73 |
| ▸ | ESR1 | P03372 | 1/20 | 0.73 |
| ▸ | CA3 | P07451 | 1/20 | 0.73 |
| ▸ | CA4 | P22748 | 1/20 | 0.73 |
| ▸ | CA6 | P23280 | 1/20 | 0.73 |
| ▸ | DPP4 | P27487 | 1/20 | 0.73 |
| ▸ | CA5A | P35218 | 1/20 | 0.73 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.73 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.73 |
| ▸ | APP | P05067 | 1/20 | 0.64 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9998594 | 1.00 | TYR (0.73) | TYRAKR1B10AKR1B1PKMCA12 | |
| SCHEMBL10338866 | 1.00 | TYR (0.73) | TYRAKR1B10AKR1B1PKMCA12 | |
| SCHEMBL482464 | 0.87 | TYR (0.56) | TYRAKR1B10AKR1B1PKMCA12 | |
| Coumaric Acid SCHEMBL43601 | 0.85 | ESR1 (1.00) | TYRAKR1B10AKR1B1PKMCA12 | |
| Coumaric Acid SCHEMBL20702657 | 0.85 | ESR1 (1.00) | TYRAKR1B10AKR1B1PKMCA12 | |
| Coumaric Acid SCHEMBL6333097 | 0.85 | ESR1 (1.00) | TYRAKR1B10AKR1B1PKMCA12 | |
| Coumaric Acid SCHEMBL434720 | 0.85 | ESR1 (1.00) | TYRAKR1B10AKR1B1PKMCA12 | |
| Coumaric Acid SCHEMBL6333102 | 0.85 | ESR1 (1.00) | TYRAKR1B10AKR1B1PKMCA12 | |
| Coumaric Acid SCHEMBL39106 | 0.85 | ESR1 (1.00) | TYRAKR1B10AKR1B1PKMCA12 | |
| SCHEMBL2643604 | 0.83 | CYP1A2 (0.51) | TYRAKR1B10AKR1B1PKMCA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-2129149-A | — | — | None | — | — | JP | disclosed |
| CN-118295208-A | Chemical amplification type photoresist and preparation method and application thereof | 万华化学集团股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| US-20230118467-A1 | COSMETIC OR PHARMACEUTICAL USE OF AVENANTHRAMIDE L | SYMRISE AG (DE) | 2023-04-20 | — | — | US | disclosed |
| US-20230118467-A1 | COSMETIC OR PHARMACEUTICAL USE OF AVENANTHRAMIDE L | SYMRISE AG (DE) | 2023-04-20 | — | — | US | disclosed |
| EP-4114353-A1 | COSMETIC OR PHARMACEUTICAL USE OF AVENANTHRAMIDE L | Symrise AG (DE) | 2023-01-11 | — | — | EP | disclosed |
| CN-115243670-A | Cosmetic or pharmaceutical use of avenanthramide L | 西姆莱斯股份公司 | 2022-10-25 | — | — | CN | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2000851-B1 | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | disclosed |
| US-6416928-B1 | HALOGENONIUM OR SULFONIUM SALTS OF SULFONATED DIPHENYLALKANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-6395446-B1 | CONTAINING SULFONYLDIAZOMETHANE COMPOUND AS ACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-6338931-B1 | PHOTOACID GENERATOR OF SULFONYLDIAZOMETHANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-15 | — | — | US | disclosed |
| US-20010035394-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1136885-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |
| EP-1099983-A1 | Chemically amplified positive resist composition and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-05-16 | — | — | EP | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| JP-H02129149-A | LIQUID CRYSTAL-FORMING POLYMER AND PRODUCTION THEREOF | TEIJIN LTD | 1990-05-17 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | ABL1, PI4K2B, FES | TYR 5/4885AKR1B10 3863/4885AKR1B1 4353/4885 |
| US-20230118467-A1 | COSMETIC OR PHARMACEUTICAL USE OF AVENANTHRAMIDE L | TACR1, NPSR1, TACR2 | TYR 443/4885AKR1B10 74/4885AKR1B1 65/4885 |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | PNN, PI4K2B, PI4K2A | TYR 5/4885AKR1B10 3802/4885AKR1B1 4349/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.