SCHEMBL4825046

SCHEMBL4825046

N#CC(=CC=Cc1ccccc1)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MCL1 Q07820 2/20 0.54
▸ MAPT P10636 7/20 0.49
▸ ALDH1A1 P00352 7/20 0.49
▸ LMNA P02545 7/20 0.49
▸ SMN1; SMN2 Q16637 2/20 0.49
▸ HTT P42858 1/20 0.49
▸ KDM4E B2RXH2 1/20 0.49
▸ HPGD P15428 1/20 0.49
▸ KMT2A Q03164 4/20 0.48
▸ MEN1 O00255 3/20 0.48
▸ MAOB P27338 2/20 0.46
▸ MAPK1 P28482 4/20 0.45
▸ RAB9A P51151 4/20 0.45
▸ NPC1 O15118 3/20 0.45
▸ L3MBTL1 Q9Y468 2/20 0.45
▸ CYP1A2 P05177 1/20 0.42
▸ CYP2C9 P11712 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ THRB P10828 1/20 0.42
▸ CRHBP P24387 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2681040 1.00 MCL1 (0.54) MCL1MAPTALDH1A1LMNASMN1; SMN2
SCHEMBL32670807 0.89 MAPT (0.48) MCL1MAPTALDH1A1LMNASMN1; SMN2
SCHEMBL11064199 0.86 MCL1 (0.46) MCL1MAPTALDH1A1LMNASMN1; SMN2
SCHEMBL14964958 0.85 MAPT (0.69) MAPTALDH1A1LMNASMN1; SMN2KDM4E
SCHEMBL14964957 0.85 MAPT (0.69) MAPTALDH1A1LMNASMN1; SMN2KDM4E
SCHEMBL11295275 0.81 MAOB (0.46) MCL1MAPTALDH1A1LMNASMN1; SMN2
SCHEMBL9417087 0.79 MCL1 (0.59) MCL1MAPTALDH1A1LMNASMN1; SMN2
SCHEMBL6278918 0.79 MCL1 (0.59) MCL1MAPTALDH1A1LMNASMN1; SMN2
SCHEMBL710359 0.78 RAB9A (0.53) MAPTALDH1A1LMNASMN1; SMN2KDM4E
SCHEMBL707154 0.77 RAB9A (0.68) MCL1MAPTALDH1A1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7405028-B2 Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography INFINEON TECHNOLOGIES, AG (DE) 2008-07-29 — — US disclosed
US-20050170283-A1 Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography POLARIS INNOVATIONS LIMITED (IE) 2005-08-04 — — US disclosed
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