Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9329820 | 0.77 | SLC22A6 (0.39) | — | |
| SCHEMBL6734821 | 0.77 | CA1 (0.35) | — | |
| SCHEMBL12081424 | 0.72 | TSHR (0.43) | KMT2A | |
| SCHEMBL15871302 | 0.71 | — | — | |
| SCHEMBL269050 | 0.70 | ALDH1A1 (0.48) | KMT2A | |
| SCHEMBL16018053 | 0.70 | SLC22A6 (0.43) | KMT2A | |
| SCHEMBL9748359 | 0.70 | KMT2A (0.33) | KMT2A | |
| SCHEMBL5196254 | 0.70 | KMT2A (0.30) | KMT2A | |
| SCHEMBL5197247 | 0.70 | KMT2A (0.30) | KMT2A | |
| SCHEMBL5197394 | 0.70 | KMT2A (0.30) | KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7323581-B1 | Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-01-29 | — | — | US | disclosed |
| US-20040224251-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-11 | — | — | US | disclosed |
| EP-1313744-A4 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECH MATERIALS (US) | 2004-03-31 | — | — | EP | disclosed |
| EP-1313744-A1 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-28 | — | — | EP | disclosed |
| WO-2002018394-A1 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-03-07 | — | — | WO | disclosed |