Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 2/20 | 0.39 |
| ▸ | NQO2 | P16083 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.37 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.37 |
| ▸ | PDE4A | P27815 | 1/20 | 0.37 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.37 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.37 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4825418 | 1.00 | RECQL (0.39) | RECQLNQO2MAPTNR1I2NPSR1 | |
| SCHEMBL7558887 | 0.92 | PTGS2 (0.40) | RECQLNQO2MAPTNR1I2NPSR1 | |
| SCHEMBL7558881 | 0.92 | PTGS2 (0.40) | RECQLNQO2MAPTNR1I2NPSR1 | |
| SCHEMBL297395 | 0.91 | NQO2 (0.40) | NQO2MAPTNR1I2NPSR1ALDH1A1 | |
| SCHEMBL36535 | 0.91 | NQO2 (0.40) | NQO2MAPTNR1I2NPSR1ALDH1A1 | |
| SCHEMBL1755727 | 0.90 | PTGS2 (0.38) | PTGS2 | |
| SCHEMBL4354862 | 0.90 | PTGS2 (0.38) | PTGS2 | |
| SCHEMBL1357769 | 0.90 | PTGS2 (0.38) | PTGS2 | |
| SCHEMBL4354857 | 0.90 | PTGS2 (0.38) | PTGS2 | |
| SCHEMBL18819681 | 0.88 | PARP10 (0.40) | MAPTNPSR1ALDH1A1KDM4ECYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7399575-B2 | Laminated photosensitive relief printing original plate and method for producing the relief printing plate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-07-15 | — | — | US | disclosed |
| US-20080166657-A1 | Resist composition for bulkhead formation, bulkhead of EL display device and EL display device | SUGIMOTO YASUAKI | 2008-07-10 | — | — | US | disclosed |
| US-7323284-B2 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |
| US-20060177771-A1 | Laminated photosensitive relief printing original plate and method for producing the relief printing plate | KODAK AMERICAS LTD. | 2006-08-10 | — | — | US | disclosed |
| US-20050236967-A1 | Resist composition for separator formation, separator of EL display device and EL display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| WO-2005026836-A2 | LAMINATED PHOTOSENSITIVE RELIEF PRINTING ORIGINAL PLATE AND METHOD FOR PRODUCING THE RELIEF PRINTING PLATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-03-24 | — | — | WO | disclosed |
| US-6835530-B2 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040121260-A1 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. | 2004-06-24 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |