SCHEMBL4354857

SCHEMBL4354857

CCCCCCS(=O)(=O)O/N=C(\C#N)c1ccc(OC)cc1

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 1/20 0.38
HDAC3 O15379 1/20 0.37
HDAC1 Q13547 1/20 0.37
HDAC2 Q92769 1/20 0.37
MMP9 P14780 2/20 0.37
MMP13 P45452 2/20 0.37
ADAM17 P78536 2/20 0.37
MMP1 P03956 2/20 0.37
ALPL P05186 1/20 0.36
ALPI P09923 1/20 0.36
STS P08842 4/20 0.36
MMP2 P08253 1/20 0.35
MMP3 P08254 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1357769 1.00 PTGS2 (0.38) PTGS2HDAC3HDAC1HDAC2MMP9
SCHEMBL4354862 1.00 PTGS2 (0.38) PTGS2HDAC3HDAC1HDAC2MMP9
SCHEMBL1755727 1.00 PTGS2 (0.38) PTGS2HDAC3HDAC1HDAC2MMP9
SCHEMBL7558881 0.95 PTGS2 (0.40) PTGS2HDAC3HDAC1HDAC2MMP13
SCHEMBL7558887 0.95 PTGS2 (0.40) PTGS2HDAC3HDAC1HDAC2MMP13
SCHEMBL4825409 0.90 RECQL (0.39) PTGS2
SCHEMBL4825418 0.90 RECQL (0.39) PTGS2
SCHEMBL14707492 0.88 L3MBTL1 (0.38) ALPLALPISTS
SCHEMBL18431384 0.87 LMNA (0.33) PTGS2ALPLALPISTS
SCHEMBL17557252 0.87 LMNA (0.33) PTGS2ALPLALPISTS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090207287-A1 Colored photosensitive composition, and color filter array and solid image pickup device using the same SONY CORPORATION (JP) 2009-08-20 US disclosed
US-20090207286-A1 Colored photosensitive composition, and color filter array and solid image pickup device using the same SONY CORPORATION (JP) 2009-08-20 US disclosed
US-6569596-B1 Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-05-27 US disclosed