SCHEMBL482671

SCHEMBL482671

CCCCCCN(C(=O)C(C)(C)CC)c1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(N(CCCCCC)C(=O)C(C)(C)CC)c2F)c1F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 7/20 0.34
PPARG P37231 1/20 0.32
PPARA Q07869 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482496 0.99 RIPK1 (0.34) RIPK1PPARGPPARA
SCHEMBL482924 0.96 RIPK1 (0.35) RIPK1
SCHEMBL482515 0.94 PPARG (0.31) PPARGPPARA
SCHEMBL483167 0.93 PPARG (0.32) PPARGPPARA
SCHEMBL483195 0.90 RIPK1 (0.31) RIPK1
SCHEMBL482977 0.89
SCHEMBL268503 0.88
SCHEMBL483057 0.88 RIPK1 (0.37) RIPK1
SCHEMBL483215 0.88 RIPK1 (0.33) RIPK1
SCHEMBL483088 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1249731-B1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORP (JP) 2012-04-25 EP disclosed
EP-1288720-B1 Plate-making method of printing plate FUJIFILM CORP (JP) 2012-02-01 EP disclosed
EP-1834765-A2 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM Corporation (JP) 2007-09-19 EP disclosed
US-20070212641-A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-20070015087-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-01-18 US disclosed
EP-1744212-A2 Photosensitive composition Fuji Photo Film Co., Ltd. (JP) 2007-01-17 EP disclosed
EP-1238801-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2006-05-17 EP disclosed
US-6875557-B2 Photopolymerization; development using alkalinity developer FUJI PHOTO FILM CO., LTD. (JP) 2005-04-05 US disclosed
US-6858373-B2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2005-02-22 US disclosed
US-6818372-B2 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-20030190554-A1 Photopolymerization; development using alkalinity developer FUJIFILM CORPORATION (JP) 2003-10-09 US disclosed
US-20030091933-A1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORPORATION (JP) 2003-05-15 US disclosed
US-20030084806-A1 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJIFILM CORPORATION (JP) 2003-05-08 US disclosed
EP-1288720-A1 Plate-making method of printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-03-05 EP disclosed
EP-1249731-A2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-16 EP disclosed
EP-1238801-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-09-11 EP disclosed