⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL482891 | 0.86 | — | — | |
| SCHEMBL483005 | 0.85 | RAB9A (0.37) | — | |
| SCHEMBL482888 | 0.83 | — | — | |
| SCHEMBL9879695 | 0.80 | — | — | |
| SCHEMBL29480005 | 0.78 | — | — | |
| SCHEMBL28599457 | 0.76 | — | — | |
| SCHEMBL5185685 | 0.74 | RECQL (0.31) | — | |
| SCHEMBL483212 | 0.73 | TP53 (0.37) | — | |
| SCHEMBL29104854 | 0.72 | — | — | |
| SCHEMBL9867811 | 0.72 | PARP1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12078929-B2 | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | FUJIFILM CORPORATION (JP) | 2024-09-03 | — | — | US | disclosed |
| CN-114402256-A | Organic film, method for producing same, composition, laminate, and semiconductor device | 富士胶片株式会社 | 2022-04-26 | — | — | CN | disclosed |
| US-20210302835-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20210302836-A1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-30 | — | — | US | disclosed |
| EP-1471387-B1 | Photosensitive composition and compound used thereof | FUJIFILM CORP (JP) | 2015-11-11 | — | — | EP | disclosed |
| EP-0949540-B1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJIFILM CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| EP-1249731-B1 | Photosensitive composition and negative working lithographic printing plate | FUJIFILM CORP (JP) | 2012-04-25 | — | — | EP | disclosed |
| EP-1288720-B1 | Plate-making method of printing plate | FUJIFILM CORP (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20070212641-A1 | Lithographic printing plate precursor and method for preparation of lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
| US-7267925-B2 | Photosensitive composition and novel compound used therefor | FUJIFILM CORPORATION (JP) | 2007-09-11 | — | — | US | disclosed |
| US-20030084806-A1 | FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES | FUJIFILM CORPORATION (JP) | 2003-05-08 | — | — | US | disclosed |
| EP-1288720-A1 | Plate-making method of printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-05 | — | — | EP | disclosed |
| US-6476092-B1 | Photopolymerizable composition containing a polymerizable acrylic compound with hetero-substituted methyl or halo-substituted methyl at the alpha position | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| EP-1249731-A2 | Photosensitive composition and negative working lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-16 | — | — | EP | disclosed |
| EP-1238801-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-0860741-B1 | Photopolymerizable composition | FUJI PHOTO FILM CO LTD (JP) | 2001-05-16 | — | — | EP | disclosed |
| EP-1091247-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-6051367-A | COMPRISING ONE OR MORE ADDITION-POLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUNDS AND A SPECIFIC OXIME ETHER COMPOUND; HIGH SENSITIVE TO ACTINIC RAYS RANGING FROM ULTRAVIOLET TO VISIBLE LIGHT, IMPROVED FILM STRENGTH | FUJI PHOTO FILM CO., LTD. (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0949540-A1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJI PHOTO FILM CO., LTD (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0860741-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-08-26 | — | — | EP | disclosed |