SCHEMBL482891

SCHEMBL482891

CCOCC1(C)CN(c2ccc(F)c([Ti](C3=CC=CC3)(C3=CC=CC3)c3c(F)ccc(N4CC(C)(COCC)C4=O)c3F)c2F)C1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482888 0.89
SCHEMBL482704 0.86
SCHEMBL483005 0.82 RAB9A (0.37)
SCHEMBL28593237 0.82
SCHEMBL28599457 0.73
SCHEMBL28918541 0.71
SCHEMBL9879695 0.70
SCHEMBL483212 0.70 TP53 (0.37)
SCHEMBL29104854 0.69
SCHEMBL8374784 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12078929-B2 Photosensitive resin composition, pattern forming method, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2024-09-03 US disclosed
US-20210302836-A1 PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE FUJIFILM CORPORATION (JP) 2021-09-30 US disclosed
US-20210302835-A1 PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, LAMINATE, AND DEVICE FUJIFILM CORPORATION (JP) 2021-09-30 US disclosed
EP-1249731-B1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORP (JP) 2012-04-25 EP disclosed
EP-1288720-B1 Plate-making method of printing plate FUJIFILM CORP (JP) 2012-02-01 EP disclosed
EP-1834765-A2 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM Corporation (JP) 2007-09-19 EP disclosed
US-20070212641-A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-20060268083-A1 Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same FUJI PHOTO FILM CO., LTD. 2006-11-30 US disclosed
EP-1238801-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2006-05-17 EP disclosed
US-6875557-B2 Photopolymerization; development using alkalinity developer FUJI PHOTO FILM CO., LTD. (JP) 2005-04-05 US disclosed
US-6858373-B2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2005-02-22 US disclosed
US-6818372-B2 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-20030190554-A1 Photopolymerization; development using alkalinity developer FUJIFILM CORPORATION (JP) 2003-10-09 US disclosed
US-20030091933-A1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORPORATION (JP) 2003-05-15 US disclosed
US-20030084806-A1 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJIFILM CORPORATION (JP) 2003-05-08 US disclosed
EP-1288720-A1 Plate-making method of printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-03-05 EP disclosed
US-6476092-B1 Photopolymerizable composition containing a polymerizable acrylic compound with hetero-substituted methyl or halo-substituted methyl at the alpha position FUJI PHOTO FILM CO., LTD. (JP) 2002-11-05 US disclosed
EP-1249731-A2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-16 EP disclosed
EP-1238801-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-09-11 EP disclosed
US-5026625-A Photoinitiators for polymerization of ethylenically unsaturated compounds CIBA-GEIGY CORPORATION (US) 1991-06-25 US disclosed