⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1560823 | 0.77 | — | — | |
| SCHEMBL9875599 | 0.75 | — | — | |
| SCHEMBL457921 | 0.75 | — | — | |
| SCHEMBL8730200 | 0.74 | — | — | |
| SCHEMBL5702881 | 0.74 | — | — | |
| SCHEMBL185558 | 0.73 | TP53 (0.43) | — | |
| Hydrochloric Acid SCHEMBL7366013 | 0.72 | KCNH2 (0.42) | — | |
| SCHEMBL58507 | 0.72 | — | — | |
| SCHEMBL1071998 | 0.71 | ESR1 (0.40) | — | |
| SCHEMBL2585956 | 0.71 | CALM1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 465 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110446739-B | Fluoroacetophenone-containing derivative, fluorine-containing additive, curable composition containing the same, and cured product thereof | DIC株式会社 | 2022-01-11 | — | — | CN | disclosed |
| US-10961405-B2 | Fluorine-containing acetophenone derivative, fluroine based additive, curable composition including same, and cured product thereof | DIC CORPORATION (JP) | 2021-03-30 | — | — | US | disclosed |
| CN-111954849-A | Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member | DIC株式会社 | 2020-11-17 | — | — | CN | disclosed |
| WO-2019198489-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, INSULATING MATERIAL, RESIN MATERIAL FOR SOLDER RESISTS AND RESIST MEMBER | DIC株式会社 | 2019-10-17 | — | — | WO | disclosed |
| EP-1657286-B1 | Radiation curable ink jet ink, comprising a polymerisation initiation sensitising dye | FUJIFILM CORP (JP) | 2018-07-04 | — | — | EP | disclosed |
| EP-2927218-B1 | TETRAZOLINONE COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL CO (JP) | 2018-07-04 | — | — | EP | disclosed |
| US-9957402-B2 | Compound, active energy ray curable composition, cured article thereof, printing ink, and inkjet recording ink | DIC CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| EP-1859954-B2 | Planographic printing plate precursor and stack thereof | FUJIFILM CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| EP-2042921-B1 | Pigment dispersion composition, photocurable composition and color filter | FUJIFILM CORP (JP) | 2017-10-25 | — | — | EP | disclosed |
| EP-2006738-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2017-09-06 | — | — | EP | disclosed |
| EP-0924570-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-06-23 | — | — | EP | disclosed |
| EP-0922570-A2 | Planographic printing plate precursor and a method for producing a planographic plate | Fuji Photo Film Co., Ltd. (JP) | 1999-06-16 | — | — | EP | disclosed |
| US-5837748-A | THIAZOLYLIDENE DERIVATIVE PHOTOINITIATOR; VISIBLE LIGHT PHOTOSENSITIVITY; PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-17 | — | — | US | disclosed |
| EP-0860741-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-08-26 | — | — | EP | disclosed |
| US-5721288-A | FOR UNSATURATED COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-24 | — | — | US | disclosed |
| EP-0822447-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-04 | — | — | EP | disclosed |
| US-5703140-A | CONTAINS ETHYLENICALLY UNSATURATED BOND, OXIME ETHER COMPOUND, SPECTRAL SENSITIZING DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1997-12-30 | — | — | US | disclosed |
| EP-0726497-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0726498-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0724197-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-31 | — | — | EP | disclosed |