Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.63 |
| ▸ | CDC25B | P30305 | 3/20 | 0.63 |
| ▸ | MAOA | P21397 | 5/20 | 0.52 |
| ▸ | RAB9A | P51151 | 3/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | MAPT | P10636 | 3/20 | 0.52 |
| ▸ | S100A4 | P26447 | 2/20 | 0.52 |
| ▸ | APAF1 | O14727 | 2/20 | 0.52 |
| ▸ | TDP2 | O95551 | 2/20 | 0.52 |
| ▸ | NPC1 | O15118 | 2/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 2/20 | 0.52 |
| ▸ | BLM | P54132 | 2/20 | 0.52 |
| ▸ | CES2 | O00748 | 1/20 | 0.52 |
| ▸ | TERT | O14746 | 1/20 | 0.52 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.52 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Anthraquinone SCHEMBL2152366 | 0.97 | MEN1 (0.67) | MEN1KMT2ACDC25BMAOARAB9A | |
| Anthraquinone SCHEMBL2152357 | 0.92 | MEN1 (0.75) | MEN1KMT2ACDC25BMAOARAB9A | |
| Anthraquinone SCHEMBL30003822 | 0.92 | MEN1 (0.75) | MEN1KMT2ACDC25BMAOARAB9A | |
| Naphthoquinone SCHEMBL11132565 | 0.80 | CDC25B (0.67) | MEN1KMT2ACDC25BMAOARAB9A | |
| Naphthoquinone SCHEMBL6010449 | 0.80 | CDC25B (0.67) | MEN1KMT2ACDC25BMAOARAB9A | |
| Naphthoquinone SCHEMBL9704148 | 0.80 | CDC25B (0.67) | MEN1KMT2ACDC25BMAOARAB9A | |
| Naphthoquinone SCHEMBL60195 | 0.80 | CDC25B (0.67) | MEN1KMT2ACDC25BMAOARAB9A | |
| Anthraquinone SCHEMBL14943 | 0.80 | MEN1 (1.00) | MEN1KMT2ACDC25BMAOARAB9A | |
| Anthraquinone SCHEMBL29358690 | 0.80 | MEN1 (1.00) | MEN1KMT2ACDC25BMAOARAB9A | |
| Anthraquinone SCHEMBL1901249 | 0.80 | MEN1 (1.00) | MEN1KMT2ACDC25BMAOARAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025105140-A1 | COMPOUND, POLYMER, RESIST COMPOSITION, RESIST FILM, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2025-05-22 | — | — | WO | disclosed |
| WO-2025013535-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2025-01-16 | — | — | WO | disclosed |
| WO-2024262451-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2024-12-26 | — | — | WO | disclosed |
| WO-2024135575-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2024-06-27 | — | — | WO | disclosed |
| US-11543749-B2 | Resist composition and method for producing resist pattern, and method for producing plated molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-03 | — | — | US | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| CN-101971096-B | Radiation-sensitive resin composition | NAGASE CHEMTEX CORP | 2012-11-21 | — | — | CN | disclosed |
| EP-1117003-B1 | Process of preparing a chemical amplification type resist composition | SHINETSU CHEMICAL CO (JP) | 2012-06-20 | — | — | EP | disclosed |
| EP-1039346-A1 | Resist compositions and pattering process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| US-6117621-A | APPLYING A CHEMICALLY AMPLIFIED POSITIVE RESIST OF A POLYMER WITH ACID LABILE GROUPS, A PHOTOACID GENERATOR AND A ORGANIC SOLVENT; RESOLUTION AND FOCAL DEPTH; EXPOSING, BAKING, AND DEVELOPING; CALIBRATION OF EXPOSURES AND DISSOLUTION RATES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-12 | — | — | US | disclosed |
| US-6114462-A | CROSSLINKING A POLYVINYLPHENOL DERIVATIVE WITH UNSATURATED ETHER DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-05 | — | — | US | disclosed |
| US-6048661-A | POLYMER WITH HYDROXY AND CARBOXY GROUPS AND ETHER ESTER GROUPS FOR PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-04-11 | — | — | US | disclosed |
| US-6033828-A | POLYVINYLPHENOL DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| US-6027854-A | ACTINIC RADIATION-SENSITIVE, CROSSLINKED TERPOLYMER CONTAINING STYRENIC GROUPS RING-SUBSTITUTED WITH HYDROXYL, HYDROXYALKYLOXY, CARBOXYALKYLOXY MOIETIES AND ACID LABILE GROUPS; ETCHING AND HEAT RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. | 2000-02-22 | — | — | US | disclosed |
| US-5942367-A | HIGH SENSITIVITY, RESOLUTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-08-24 | — | — | US | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |