Naphthoquinone

Naphthoquinone

SCHEMBL60195

O=C1C=CC(=O)c2ccccc21.[N-]=[N+]=N.[N-]=[N+]=[N-]

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 5/20 0.67
IDO1 P14902 5/20 0.67
MAOA P21397 3/20 0.67
PIN1 Q13526 2/20 0.67
EHMT2 Q96KQ7 2/20 0.67
MAOB P27338 2/20 0.67
SNCA P37840 2/20 0.67
AKT1 P31749 1/20 0.67
MAP2K1 Q02750 1/20 0.67
NSD1 Q96L73 1/20 0.67
EHMT1 Q9H9B1 1/20 0.67
MEN1 O00255 9/20 0.41
KMT2A Q03164 9/20 0.41
ALDH1A1 P00352 8/20 0.41
MAPT P10636 7/20 0.41
HPGD P15428 5/20 0.41
RECQL P46063 4/20 0.41
KDM4E B2RXH2 4/20 0.41
THRB P10828 4/20 0.41
ALOX15 P16050 4/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthoquinone SCHEMBL11132565 1.00 CDC25B (0.67) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL6010449 1.00 CDC25B (0.67) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL9704148 1.00 CDC25B (0.67) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL482597 0.98 IDO1 (0.70) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL7526925 0.94 CDC25B (0.58) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL29458764 0.93 IDO1 (0.78) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL482594 0.93 IDO1 (0.78) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL29837141 0.93 IDO1 (0.78) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL1395610 0.90 IDO1 (0.54) CDC25BIDO1MAOAPIN1EHMT2
Naphthoquinone SCHEMBL10579011 0.90 CDC25B (0.54) CDC25BIDO1MAOAPIN1EHMT2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5708 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260090200-A1 ORGANIC LIGHT-EMITTING ELEMENT, AND DISPLAY APPARATUS, IMAGING APPARATUS, LIGHTING APPARATUS, ELECTRONIC EQUIPMENT, AND IMAGE-FORMING APPARATUS INCLUDING THE SAME CANON KK (JP) 2026-03-26 US claimed
US-20260047474-A1 SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-02-12 US claimed
US-12520661-B2 Organic light-emitting element, and display apparatus, imaging apparatus, lighting apparatus, electronic equipment, and image-forming apparatus including the same CANON KABUSHIKI KAISHA (JP) 2026-01-06 US claimed
US-20260003276-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2026-01-01 US claimed
WO-2025260141-A1 METHOD OF PRODUCING A PATTERNED MATERIAL ON A FILM NEWSOUTH INNOVATIONS PTY LIMITED (AU) 2025-12-26 WO claimed
US-20250382492-A1 LAMINATE, METHOD FOR MANUFACTURING LAMINATE, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT TORAY INDUSTRIES, INC. (JP) 2025-12-18 US claimed
US-12405531-B2 Organic EL display device, production method for cured product, and production method for organic EL display device TORAY INDUSTRIES, INC. (JP) 2025-09-02 US claimed
US-20250264801-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-08-21 US claimed
US-20250199402-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME TORAY INDUSTRIES, INC. (JP) 2025-06-19 US claimed
WO-2025105331-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2025-05-22 WO claimed
EP-0070624-A1 Novolak resin and a positive photoresist composition containing the same PHILIP A. HUNT CHEMICAL CORPORATION (US) 1983-01-26 EP claimed
EP-0001254-B1 POSITIVELY WORKING LIGHT-SENSITIVE COMPOSITION COMPRISING A HALOGENATED NAPHTHOQUINONE-DIAZIDE HOECHST AKTIENGESELLSCHAFT (DE) 1982-09-22 EP claimed
US-4294911-A AND A QUATERNARY ALKANOL AMMONIUM HYDROXIDE DEVELOPING AGENT EASTMAN KODAK COMPANY (US) 1981-10-13 US claimed
US-4283478-A COMPRISING A SILVER HALIDE LAYER AND A LAYER OF POSITIVE WORKING LIGHT SENSITIVE RESIN FUJI PHOTO FILM CO., LTD. (JP) 1981-08-11 US claimed
US-4232106-A Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors FUJI PHOTO FILM CO., LTD. (JP) 1980-11-04 US claimed
US-4163672-A DIRECT POSITIVES, PHOTORESISTS, PRINTING PLATES, SHELF LIFE HOECHST AKTIENGESELLSCHAFT (DE) 1979-08-07 US claimed
US-4160671-A ESTER OR AMIDE OF AN O-NAPHTHOQUINONE DIAZIDE SULFONIC ACID, ORGANIC DYE, HALOGEN-CONTAINING DERIVATIVE OF PYRONE OR TRIAZINE HOECHST AKTIENGESELLSCHAFT (DE) 1979-07-10 US claimed
US-4141733-A Development of light-sensitive quinone diazide compositions EASTMAN KODAK COMPANY (US) 1979-02-27 US claimed
US-4093461-A ORTHOQUINONE OR NAPHTHOQUINONE DIAZIDE AND CONDENSATION PRODUCT OF AROMATIC DIANHYDRIDE AND AROMATIC DI-PRIMARY AMINE GAF CORPORATION (US) 1978-06-06 US claimed
US-3996056-A Diazotype reproduction layer formed from matrix of spheric particle polystyrene pigment and diazotype components ANDREWS PAPER & CHEMICAL CO. (US) 1976-12-07 US claimed