SCHEMBL4829965

SCHEMBL4829965

CC(C)(O[SiH3])c1ccco1

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.42
TP53 P04637 1/20 0.36
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
POLB P06746 1/20 0.33
TSHR P16473 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12390037 0.80 MAPT (0.43) MAPTTP53CYP3A4CYP2D6CYP2C9
SCHEMBL14622470 0.78 MAPT (0.46) MAPTTP53CYP3A4CYP2D6CYP2C9
SCHEMBL8100623 0.75 MAPT (0.44) MAPTTP53CYP3A4CYP2D6CYP2C9
SCHEMBL4983413 0.74 MAPT (0.48) MAPTTP53CYP3A4CYP2D6CYP2C9
SCHEMBL418090 0.74
SCHEMBL181942 0.74 MAPT (0.48) MAPTTP53CYP3A4CYP2D6CYP2C9
SCHEMBL28297060 0.74 MAPT (0.48) MAPTTP53CYP3A4CYP2D6CYP2C9
SCHEMBL28968872 0.74 MAPT (0.42) MAPTTP53KDM4EMEN1ALDH1A1
SCHEMBL27582390 0.74 MAPT (0.42) MAPTTP53CYP3A4CYP2D6CYP2C9
SCHEMBL28968874 0.72 MAPT (0.45) MAPTCYP3A4CYP2D6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6890639-B2 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. (US) 2005-05-10 US claimed
US-20020142585-A1 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. 2002-10-03 US claimed
US-7399697-B2 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. (US) 2008-07-15 US disclosed
US-20050136240-A1 Very low dielectric constant plasma-enhanced CVD films MANDAL ROBERT P (US) 2005-06-23 US disclosed
US-6890639-B2 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. (US) 2005-05-10 US disclosed
US-20020142585-A1 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. 2002-10-03 US disclosed