SCHEMBL8100623

SCHEMBL8100623

C=C([SiH3])OC(C)(C)c1ccco1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.44
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL75128 0.78 MAPT (0.41) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL28968872 0.78 MAPT (0.42) MAPTNPC1RAB9ASMN1; SMN2MEN1
SCHEMBL28968874 0.76 MAPT (0.45) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL7629307 0.76
SCHEMBL8832817 0.76 MAPT (0.47) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL4829965 0.75 MAPT (0.42) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL14622470 0.75 MAPT (0.46) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL74952 0.75 MAPT (0.47) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL12390037 0.72 MAPT (0.43) MAPTCYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL12390099 0.72 MAPT (0.38) MAPTNPC1RAB9ASMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
US-6001165-A FOR INK JET PRINTERS WHICH ABSORBS INK RAPIDLY, DOES NOT BLOT, WATER RESISTANCE OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1999-12-14 US disclosed
EP-0887200-A1 Coating composition for recording material and process for producing recording material OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1998-12-30 EP disclosed
CN-1203250-A Coating composition for recording material and process for producing recording material OJI YUKA SYNT PAPER CO LTD (JP) 1998-12-30 CN disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed