SCHEMBL4830564

SCHEMBL4830564

C=C(C)C(=O)Sc1cccc2ccccc12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
NR4A1 P22736 1/20 0.39
NR4A2 P43354 1/20 0.39
NR4A3 Q92570 1/20 0.39
LMNA P02545 2/20 0.39
RECQL P46063 1/20 0.39
PLK1 P53350 1/20 0.39
SIRT2 Q8IXJ6 1/20 0.38
SIRT1 Q96EB6 1/20 0.38
SIRT3 Q9NTG7 1/20 0.38
PTK2B Q14289 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MAPT P10636 1/20 0.38
HPGD P15428 1/20 0.38
MTNR1A P48039 1/20 0.37
MTNR1B P49286 1/20 0.37
IFNAR1 P17181 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27233193 0.89 CA12 (0.36) ALDH1A1MEN1KMT2AMAPTHPGD
SCHEMBL25411276 0.84 ALDH1A1 (0.34) ALDH1A1SIRT2SIRT1SIRT3MAPT
SCHEMBL1803486 0.83 CA12 (0.44) ALDH1A1SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL29037958 0.82 LMNA (0.39) ALDH1A1SMN1; SMN2MEN1KMT2ANR4A1
SCHEMBL27233191 0.82 USP2 (0.39) ALDH1A1MEN1KMT2AL3MBTL1MAPT
SCHEMBL29137794 0.82 IFNAR1 (0.41) ALDH1A1SMN1; SMN2NR4A1NR4A2NR4A3
SCHEMBL21694354 0.82 CA12 (0.53) ALDH1A1SMN1; SMN2MEN1KMT2ANR4A1
SCHEMBL10752579 0.81 POLB (0.42) ALDH1A1SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL10750350 0.79 HPGD (0.43) ALDH1A1SMN1; SMN2MEN1KMT2ALMNA
SCHEMBL10752154 0.79 NCEH1 (0.36) ALDH1A1MEN1KMT2ALMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118055922-A Naphthalene dithiol and its derivatives, and their preparation method and use 菅井化学工业株式会社 2024-05-17 CN disclosed
CN-117157277-A 1, 6-naphthalene dithiol and process for producing the same 菅井化学工业株式会社 2023-12-01 CN disclosed
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed