Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | THRB | P10828 | 2/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Di(Hydroxyethyl)Ether SCHEMBL10711395 | 0.85 | LMNA (0.60) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Ethylene Glycol SCHEMBL11566968 | 0.84 | LMNA (0.47) | ALDH1A1TSHRTHRBLMNATDP1 | |
| Di(Hydroxyethyl)Ether SCHEMBL4840428 | 0.83 | TSHR (0.52) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL9640229 | 0.82 | MEN1 (0.58) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL157251 | 0.82 | MEN1 (0.58) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL3876514 | 0.82 | MEN1 (0.58) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL9639782 | 0.82 | MEN1 (0.58) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL9640265 | 0.82 | MEN1 (0.58) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL9639247 | 0.82 | MEN1 (0.58) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL9640528 | 0.82 | MEN1 (0.58) | ALDH1A1TSHRMAPK1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-10139633-A | — | — | None | — | — | JP | disclosed |
| WO-2025028519-A1 | BLOCKED ISOCYANATE COMPOSITION, COATING MATERIAL COMPOSITION, AND COATING FILM | 旭化成株式会社 | 2025-02-06 | — | — | WO | disclosed |
| US-20240287243-A1 | BLOCKED POLYISOCYANATE COMPOSITION, RESIN COMPOSITION, RESIN FILM AND LAMINATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-08-29 | — | — | US | disclosed |
| EP-4364944-A1 | BLOCK POLYISOCYANATE COMPOSITION, RESIN COMPOSITION, RESIN FILM, AND LAYERED BODY | Asahi Kasei Kabushiki Kaisha (JP) | 2024-05-08 | — | — | EP | disclosed |
| EP-3771720-B1 | BLOCKED POLYISOCYANATE COMPOSITION, RESIN COMPOSITION, RESIN FILM AND LAMINATE | ASAHI CHEMICAL IND (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-116082936-B | Blocked polyisocyanate composition and method for producing same, resin composition, resin film and method for producing same, and laminate | 旭化成株式会社 | 2024-04-05 | — | — | CN | disclosed |
| EP-3689936-B1 | BLOCKED POLYISOCYANATE COMPOSITION AND USE THEREOF | ASAHI CHEMICAL IND (JP) | 2024-03-06 | — | — | EP | disclosed |
| CN-117580887-A | Blocked polyisocyanate composition, resin film, and laminate | 旭化成株式会社 | 2024-02-20 | — | — | CN | disclosed |
| EP-4321585-A2 | BLOCKED POLYISOCYANATE COMPOSITION AND METHOD FOR PRODUCING THE SAME, RESIN COMPOSITION, RESIN FILM AND METHOD FOR PRODUCING THE SAME, AND LAMINATE | Asahi Kasei Kabushiki Kaisha (JP) | 2024-02-14 | — | — | EP | disclosed |
| CN-113939552-B | Blocked polyisocyanate composition, one-component coating composition, coating film and coated article | 旭化成株式会社 | 2024-01-30 | — | — | CN | disclosed |
| CN-103946747-A | Negative-type photosensitive resin composition, partition wall, black matrix, and optical element | ASAHI GLASS CO LTD | 2014-07-23 | — | — | CN | disclosed |
| CN-102898149-A | Solvent or solvent composition for manufacturing laminated ceramic member | DAICEL CHEM | 2013-01-30 | — | — | CN | disclosed |
| CN-102731112-A | Solvent or solvent composition for producing laminated ceramic component | DAICEL FINECHEM LTD | 2012-10-17 | — | — | CN | disclosed |
| US-7338737-B2 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-04 | — | — | US | disclosed |
| US-7297452-B2 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-11-20 | — | — | US | disclosed |
| US-20070254221-A1 | Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. | SAMSUNG DISPLAY CO., LTD. (KR) | 2007-11-01 | — | — | US | disclosed |
| US-20060141393-A1 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. | 2006-06-29 | — | — | US | disclosed |
| US-20060131267-A1 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG DISPLAY CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |
| JP-H10139633-A | HAIR COSMETIC | KAO CORP | 1998-05-26 | — | — | JP | disclosed |
| US-4176132-A | Reaction of organic diisocyanates with water | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1979-11-27 | — | — | US | disclosed |