SCHEMBL483362

SCHEMBL483362

CCCC(C)(C)C(=O)N(CC1CCCO1)c1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(N(CC3CCCO3)C(=O)C(C)(C)CCC)c2F)c1F

nearest known ligand 0.32

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MLYCD O95822 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
PSEN1 P49768 2/20 0.30
PSEN2 P49810 2/20 0.30
APH1B Q8WW43 2/20 0.30
NCSTN Q92542 2/20 0.30
APH1A Q96BI3 2/20 0.30
PSENEN Q9NZ42 2/20 0.30
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL483322 0.86 HDAC3 (0.30)
SCHEMBL9800166 0.85 TP53 (0.34) L3MBTL1TP53
SCHEMBL482930 0.83 MEN1 (0.41)
SCHEMBL599437 0.82 SMN1; SMN2 (0.41) TP53
SCHEMBL483195 0.81 RIPK1 (0.31)
SCHEMBL482515 0.80 PPARG (0.31)
SCHEMBL482535 0.79 RIPK1 (0.38)
SCHEMBL483087 0.79
SCHEMBL482927 0.79
SCHEMBL23854471 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1249731-B1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORP (JP) 2012-04-25 EP disclosed
EP-1288720-B1 Plate-making method of printing plate FUJIFILM CORP (JP) 2012-02-01 EP disclosed
EP-1744212-B1 Photosensitive composition FUJIFILM CORP (JP) 2012-01-11 EP disclosed
EP-1834765-A2 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM Corporation (JP) 2007-09-19 EP disclosed
US-20070212641-A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-20070015087-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-01-18 US disclosed
EP-1744212-A2 Photosensitive composition Fuji Photo Film Co., Ltd. (JP) 2007-01-17 EP disclosed
EP-1238801-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2006-05-17 EP disclosed
US-6875557-B2 Photopolymerization; development using alkalinity developer FUJI PHOTO FILM CO., LTD. (JP) 2005-04-05 US disclosed
US-6858373-B2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2005-02-22 US disclosed
US-6818372-B2 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-20030190554-A1 Photopolymerization; development using alkalinity developer FUJIFILM CORPORATION (JP) 2003-10-09 US disclosed
US-20030091933-A1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORPORATION (JP) 2003-05-15 US disclosed
US-20030084806-A1 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJIFILM CORPORATION (JP) 2003-05-08 US disclosed
EP-1288720-A1 Plate-making method of printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-03-05 EP disclosed
EP-1249731-A2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-16 EP disclosed
EP-1238801-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-09-11 EP disclosed