SCHEMBL4840288

SCHEMBL4840288

CCC(C)OCCOCCOC(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28140840 0.94 MAPK1 (0.36) MAPK1
SCHEMBL8529485 0.91 MEN1 (0.38) MAPK1
SCHEMBL1476765 0.84 TDP1 (0.33)
SCHEMBL1476547 0.84 TDP1 (0.33)
SCHEMBL25868823 0.81 TDP1 (0.39) MAPK1
SCHEMBL20128728 0.80 MAPK1 (0.36) MAPK1
SCHEMBL20317396 0.80 MAPK1 (0.36) MAPK1
SCHEMBL4838635 0.80 MAPK1 (0.36) MAPK1
SCHEMBL20365417 0.80 MAPK1 (0.36) MAPK1
SCHEMBL4830565 0.78 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1760757-B Radioactivity sensitive resin composition SUMITOMO CHEMICAL CO 2010-11-10 CN disclosed
CN-1760758-B Radioactivity sensitive resin composition SUMITOMO CHEMICAL CO 2010-11-03 CN disclosed
US-7338737-B2 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-04 US disclosed
US-7297452-B2 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-11-20 US disclosed
US-20070254221-A1 Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. SAMSUNG DISPLAY CO., LTD. (KR) 2007-11-01 US disclosed
US-20060141393-A1 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. 2006-06-29 US disclosed
US-20060131267-A1 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG DISPLAY CO., LTD. (KR) 2006-06-22 US disclosed
CN-1760758-A Radioactivity sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2006-04-19 CN disclosed
CN-1760757-A Radioactivity sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2006-04-19 CN disclosed