SCHEMBL48437

SCHEMBL48437

CSc1cc(SC)c(N)c(C)c1N

nearest known ligand 0.33

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33
TSHR P16473 2/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13610641 0.90 ALDH1A1 (0.31) ALDH1A1TSHRTP53CYP3A4TDP1
SCHEMBL9184047 0.87 ALDH1A1 (0.40) ALDH1A1TSHRTP53CYP3A4TDP1
SCHEMBL6910768 0.85 AOC3 (0.32)
SCHEMBL5837930 0.83 ALDH1A1 (0.33) ALDH1A1TSHRTP53CYP3A4TDP1
SCHEMBL28463583 0.80 NPC1 (0.31) NPC1RAB9A
SCHEMBL4049980 0.80 CASP1 (0.61) ALDH1A1TSHRCYP3A4TDP1NPC1
SCHEMBL15700586 0.80
SCHEMBL10569631 0.80 ALDH1A1 (0.45) ALDH1A1TSHRTP53CYP3A4TDP1
SCHEMBL16775207 0.79
SCHEMBL762133 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2650 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250250460-A1 COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS BERTECH PANAMA S.A. (PA) 2025-08-07 US claimed
WO-2025100921-A1 POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME 에스케이엔펄스 주식회사 2025-05-15 WO claimed
US-20250144766-A1 POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME ENPULSE CO., LTD. (KR) 2025-05-08 US claimed
US-20250144767-A1 POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAINED THEREFROM ENPULSE CO., LTD. (KR) 2025-05-08 US claimed
EP-4549090-A1 POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAINED THEREFROM SK enpulse Co., Ltd. (KR) 2025-05-07 EP claimed
US-20250065540-A1 CAST ELASTOMERS WITH TUNABLE MATERIAL PROPERTY DEVELOPMENT ACUSHNET COMPANY (US) 2025-02-27 US claimed
US-20250033160-A1 POLISHING PAD WITH REDUCED DEFECT AND METHOD OF PREPARING A SEMICONDUCTOR DEVICE USING THE SAME ENPULSE CO., LTD. (KR) 2025-01-30 US claimed
EP-4308520-B1 ISOCYANATE-AMINO-BASED CHEMICAL DOWEL WITH IMPROVED PERFORMANCE AND ITS USE HILTI AG (LI) 2025-01-15 EP claimed
CN-118955850-A Polyurethane polyurea foaming material and preparation method and application thereof 江苏长顺高分子材料研究院有限公司 2024-11-15 CN claimed
US-12122013-B2 Composition for polishing pad and polishing pad SK ENPULSE CO., LTD. (KR) 2024-10-22 US claimed
EP-0329821-A2 Polyhydroxyalkane/aromatic diamine chain extenders ETHYL CORPORATION (US) 1989-08-30 EP claimed
US-4786656-A FOR POLYURETHANES ETHYL CORPORATION (US) 1988-11-22 US claimed
EP-0289870-A2 Epoxy resin compositions ETHYL CORPORATION (US) 1988-11-09 EP claimed
US-4757119-A Diamine curing agent ETHYL CORPORATION (US) 1988-07-12 US claimed
US-4727191-A WASHING WITH ACID ETHYL CORPORATION (US) 1988-02-23 US claimed
EP-0253593-A1 Purification of (hydrocarbylthio) aromatic amines ETHYL CORPORATION (US) 1988-01-20 EP claimed
EP-0228190-A2 RIM polyurethanes comprising mixed diamine chain extenders and process and composition for their production ETHYL CORPORATION (US) 1987-07-08 EP claimed
US-4631298-A REACTION INJECTION MOLDING POLYURETHANES ETHYL CORPORATION (US) 1986-12-23 US claimed
EP-0193872-A2 Di(alkylthio) diamine chain extenders for polyurethane elastomers ETHYL CORPORATION (US) 1986-09-10 EP claimed
US-4595742-A Formed by reacting polyisocyanate, an organic active hydrogen group containing compound, and a chain extender comprising an aromatic diamine ETHYL CORPORATION (US) 1986-06-17 US claimed