SCHEMBL4844814

SCHEMBL4844814

CC=C(N(CC(O)CO)CC(O)CO)N(CC(O)CO)CC(O)CO

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.38
ALDH1A1 P00352 1/20 0.38
THRB P10828 1/20 0.32
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4349775 0.74 KDM4E (0.35) ALDH1A1TDP1
SCHEMBL3379471 0.72 LMNA (0.40) LMNAALDH1A1THRBTDP1
Glycerin SCHEMBL6290866 0.68
SCHEMBL10424283 0.67 LMNA (0.47) LMNAALDH1A1THRBTDP1
SCHEMBL7718395 0.67
SCHEMBL11137 0.67
SCHEMBL19206137 0.67
SCHEMBL6516983 0.67
SCHEMBL1085808 0.66 LMNA (0.53) LMNAALDH1A1THRBTDP1
Glycerin SCHEMBL27732333 0.66 LMNA (0.64) LMNAALDH1A1THRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11913131-B2 Ternary zinc-nickel-iron alloys and alkaline electrolytes or plating such alloys MACDERMID, INCORPORATED (US) 2024-02-27 US disclosed
US-20200071843-A1 TERNARY ZINC-NICKEL-IRON ALLOYS AND ALKALINE ELECTROLYTES OR PLATING SUCH ALLOYS MACDERMID, INCORPORATED 2020-03-05 US disclosed
EP-1718786-B1 BATHS, SYSTEMS AND PROCESSES FOR ELECTROPLATING ZINC-NICKEL TERNARY AND HIGHER ALLOYS AND ARTICLES SO ELECTROPLATED ATOTECH DEUTSCHLAND GMBH (DE) 2016-11-30 EP disclosed
US-7442286-B2 Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys ATOTECH DEUTSCHLAND GMBH (DE) 2008-10-28 US disclosed
EP-1201789-B9 Plating bath and method for electroplating tin-zinc alloys ATOTECH DEUTSCHLAND GMBH (DE) 2006-11-15 EP disclosed
EP-1718786-A1 BATHS, SYSTEMS AND PROCESSES FOR ELECTROPLATING ZINC-NICKEL TERNARY AND HIGHER ALLOYS AND ARTICLES SO ELECTROPLATED ATOTECH Deutschland GmbH (DE) 2006-11-08 EP disclosed
US-20060201820-A1 Aqueous zinc-nickel electroplating alkaline bath, comprising water zinc compound, nickel compound, complexing agent and polyoxyalkylene nonionic surfactant; alloying; smoothness, ductility OPASKAR VINCENT C 2006-09-14 US disclosed
EP-1201789-B1 Plating bath and method for electroplating tin-zinc alloys ATOTECH DEUTSCHLAND GMBH (DE) 2006-06-07 EP disclosed
WO-2005093133-A1 BATHS, SYSTEMS AND PROCESSES FOR ELECTROPLATING ZINC-NICKEL TERNARY AND HIGHER ALLOYS AND ARTICLES SO ELECTROPLATED ATOTECH DEUTSCHLAND GMBH (DE) 2005-10-06 WO disclosed
US-20050189231-A1 Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys ATOTECH USA, LLC 2005-09-01 US disclosed
US-20050133376-A1 Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom ATOTECH USA, LLC 2005-06-23 US disclosed
US-6436269-B1 COMPRISING SOLUBLE METAL COMPOUNDS AND A CATIONIC POLYMER USED FOR ELECTRODEPOSITION OF METALS HAVING BRIGHT, UNIFORM COATINGS AND A WIDE CURRENT DENSITY RANGE; SOLDERS ATOTECH DEUTSCHLAND GMBH (DE) 2002-08-20 US disclosed
EP-1201789-A2 Plating bath and method for electroplating tin-zinc alloys ATOTECH Deutschland GmbH (DE) 2002-05-02 EP disclosed
EP-0649918-B1 Alkaline zinc-nickel alloy plating baths ROHCO INC MCGEAN (US) 1996-11-20 EP disclosed
US-5417840-A Quaternary ammonium compound containing nitrogen heterocycle, brightness MCGEAN-ROHCO, INC. (US) 1995-05-23 US disclosed
EP-0649918-A1 Alkaline zinc-nickel alloy plating baths MCGEAN-ROHCO, INC. (US) 1995-04-26 EP disclosed