SCHEMBL4847737

SCHEMBL4847737

CCN(CC)CCN(CC)CCO

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.56
CYP2C9 P11712 1/20 0.56
HPGD P15428 1/20 0.56
MAPK1 P28482 1/20 0.56
HIF1A Q16665 1/20 0.56
HSD17B10 Q99714 1/20 0.56
MAPT P10636 3/20 0.40
CYP2D6 P10635 2/20 0.37
ALDH1A1 P00352 5/20 0.37
KDM4E B2RXH2 2/20 0.37
ALOX15 P16050 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
ALDH2 P05091 1/20 0.37
ARG1 P05089 1/20 0.36
ARG2 P78540 1/20 0.36
PAOX Q6QHF9 1/20 0.33
LMNA P02545 1/20 0.32
TSHR P16473 1/20 0.31
SLC29A1 Q99808 1/20 0.31
MEN1 O00255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14075760 1.00 CYP1A2 (0.56) CYP1A2CYP2C9HPGDMAPK1HIF1A
SCHEMBL7847332 0.97 CYP1A2 (0.58) CYP1A2CYP2C9HPGDMAPK1HIF1A
SCHEMBL7847871 0.97 CYP1A2 (0.58) CYP1A2CYP2C9HPGDMAPK1HIF1A
SCHEMBL3923168 0.97 CYP1A2 (0.58) CYP1A2CYP2C9HPGDMAPK1HIF1A
SCHEMBL2845423 0.94 CYP1A2 (0.50) CYP1A2CYP2C9HPGDMAPK1HIF1A
SCHEMBL21531945 0.94 CYP1A2 (0.56) CYP1A2CYP2C9HPGDMAPK1HIF1A
Diethylaminoethanol SCHEMBL10699915 0.94
Diethylaminoethanol SCHEMBL3114 0.94
SCHEMBL35602 0.94
Diethylaminoethanol SCHEMBL20815437 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4504665-A1 ELECTROCHEMICAL OXIDATION OF AMINE COMPLEXANTS IN WASTE STREAMS FROM ELECTROPLATING PROCESSES MacDermid, Incorporated (US) 2025-02-12 EP claimed
US-20230322588-A1 Electrochemical Oxidation of Amine Complexants in Waste Streams from Electroplating Processes MACDERMID, INCORPORATED 2023-10-12 US claimed
WO-2023196226-A1 ELECTROCHEMICAL OXIDATION OF AMINE COMPLEXANTS IN WASTE STREAMS FROM ELECTROPLATING PROCESSES MACDERMID, INCORPORATED (US) 2023-10-12 WO claimed
EP-2878609-B1 AMINE CATALYST FOR CURING POLYISOCYANATE COMPOUND AND POLYISOCYANATE ADHESIVE COMPOSITION CONTAINING AMINE CATALYST FOR CURING POLYISOCYANATE COMPOUND TOSOH CORP (JP) 2019-06-05 EP claimed
US-9777199-B2 Amine catalyst for curing polyisocyanate compound and polyisocyanate adhesive composition containing amine catalyst for curing polyisocyanate compound TOSOH CORPORATION (JP) 2017-10-03 US claimed
US-20150203727-A1 AMINE CATALYST FOR CURING POLYISOCYANATE COMPOUND AND POLYISOCYANATE ADHESIVE COMPOSITION CONTAINING AMINE CATALYST FOR CURING POLYISOCYANATE COMPOUND TOSOH CORPORATION (JP) 2015-07-23 US claimed
EP-2878609-A1 AMINE CATALYST FOR CURING POLYISOCYANATE COMPOUND AND POLYISOCYANATE ADHESIVE COMPOSITION CONTAINING AMINE CATALYST FOR CURING POLYISOCYANATE COMPOUND Tosoh Corporation (JP) 2015-06-03 EP claimed
US-20260102348-A1 COMPOUND OR SALT THEREOF AND LIPID PARTICLES FUJIFILM CORPORATION (JP) 2026-04-16 US disclosed
EP-4332086-B1 COMPOUND OR SALT THEREOF, LIPID PARTICLES, AND PHARMACEUTICAL COMPOSITION FUJIFILM CORP (JP) 2026-04-08 EP disclosed
US-12546027-B2 Anode for electroplating, and method and system for electroplating articles with metal DIPSOL CHEMICALS CO., LTD. (JP) 2026-02-10 US disclosed
US-12508226-B2 Lipid composition FUJIFILM CORPORATION (JP) 2025-12-30 US disclosed
EP-4644589-A2 ALKALINE ZINC-NICKEL ALLOY PLATING SOLUTION AND ZINC-NICKEL ALLOY BARREL PLATING METHOD USING THE SAME Dipsol Chemicals Co., Ltd. (JP) 2025-11-05 EP disclosed
US-12370143-B2 Compound or salt thereof and lipid particles FUJIFILM CORPORATION (JP) 2025-07-29 US disclosed
US-20050189231-A1 Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys ATOTECH USA, LLC 2005-09-01 US disclosed
US-20050133376-A1 Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom ATOTECH USA, LLC 2005-06-23 US disclosed
US-6436269-B1 COMPRISING SOLUBLE METAL COMPOUNDS AND A CATIONIC POLYMER USED FOR ELECTRODEPOSITION OF METALS HAVING BRIGHT, UNIFORM COATINGS AND A WIDE CURRENT DENSITY RANGE; SOLDERS ATOTECH DEUTSCHLAND GMBH (DE) 2002-08-20 US disclosed
EP-1201789-A2 Plating bath and method for electroplating tin-zinc alloys ATOTECH Deutschland GmbH (DE) 2002-05-02 EP disclosed
EP-0649918-B1 Alkaline zinc-nickel alloy plating baths ROHCO INC MCGEAN (US) 1996-11-20 EP disclosed
US-5417840-A Quaternary ammonium compound containing nitrogen heterocycle, brightness MCGEAN-ROHCO, INC. (US) 1995-05-23 US disclosed
EP-0649918-A1 Alkaline zinc-nickel alloy plating baths MCGEAN-ROHCO, INC. (US) 1995-04-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12370143-B2 Compound or salt thereof and lipid particles NR1H3, NR1H2, LDLR CYP1A2 1806/4885CYP2C9 1329/4885HPGD 4024/4885
US-20260102348-A1 COMPOUND OR SALT THEREOF AND LIPID PARTICLES LDLR, NR1H3, NR1H2 CYP1A2 3645/4885CYP2C9 3691/4885HPGD 3851/4885
US-12508226-B2 Lipid composition APOB, NAF1, SLC27A1 CYP1A2 4015/4885CYP2C9 3085/4885HPGD 4328/4885
US-12546027-B2 Anode for electroplating, and method and system for electroplating articles with metal DCX, CACNA2D3, CACNA2D4 CYP1A2 2034/4885CYP2C9 4023/4885HPGD 4063/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.