Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36259 | 0.85 | TSHR (0.44) | TSHR | |
| Acrylic Acid SCHEMBL28979644 | 0.80 | TSHR (0.38) | TSHR | |
| SCHEMBL26362949 | 0.77 | TSHR (0.43) | TSHR | |
| SCHEMBL30115037 | 0.77 | TSHR (0.33) | TSHR | |
| SCHEMBL5420151 | 0.75 | TSHR (0.30) | TSHR | |
| SCHEMBL4843903 | 0.75 | TSHR (0.30) | TSHR | |
| Methacrylic Acid SCHEMBL28209124 | 0.74 | TSHR (0.43) | TSHR | |
| SCHEMBL24305378 | 0.72 | HTT (0.32) | TSHR | |
| SCHEMBL227643 | 0.72 | TSHR (0.47) | TSHR | |
| Methacrylic Acid SCHEMBL28908234 | 0.71 | ALDH1A1 (0.40) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7462439-B2 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-12-09 | — | — | US | claimed |
| US-7303858-B2 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2007-12-04 | — | — | US | claimed |
| US-20070003861-A1 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-01-04 | — | — | US | claimed |
| US-20060127804-A1 | Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-06-15 | — | — | US | claimed |
| US-7462439-B2 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-12-09 | — | — | US | disclosed |
| US-7303858-B2 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2007-12-04 | — | — | US | disclosed |
| US-20070003861-A1 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-01-04 | — | — | US | disclosed |
| US-20060127804-A1 | Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-06-15 | — | — | US | disclosed |