Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3370071 | 0.92 | ALDH1A1 (0.43) | ALDH1A1TSHR | |
| SCHEMBL74982 | 0.84 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL4261488 | 0.83 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRB | |
| SCHEMBL24486022 | 0.83 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRB | |
| SCHEMBL16787498 | 0.83 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRB | |
| SCHEMBL17938239 | 0.82 | ALDH1A1 (0.46) | ALDH1A1TSHR | |
| SCHEMBL8182848 | 0.82 | ALDH1A1 (0.42) | ALDH1A1TSHR | |
| SCHEMBL20972875 | 0.81 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL25278 | 0.79 | — | — | |
| SCHEMBL372980 | 0.79 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112241107-A | Positive photosensitive resin composition, photosensitive resin film, and display device using same | 株式会社东进世美肯 | 2021-01-19 | — | — | CN | claimed |
| US-20080054171-A1 | Target for Laser Desorption/Ionisation Mass Spectrometry | PHYSIKALISCHES BURO STEINMULLER GMBH | 2008-03-06 | — | — | US | claimed |
| WO-2007030849-A1 | METHOD FOR DETECTING ORGANIC COMPOUNDS | Austria Wirtschaftsservice Gesellschaft mit beschränkter Haftung (AT) | 2007-03-22 | — | — | WO | claimed |
| EP-1738397-A2 | TARGET FOR LASER DESORPTION/IONISATION MASS SPECTROMETRY | Physikalisches Büro Steinmüller GmbH (AT) | 2007-01-03 | — | — | EP | claimed |
| WO-2005096346-A2 | TARGET FOR LASER DESORPTION/IONISATION MASS SPECTROMETRY | PHYSIKALISCHES BÜRO STEINMÜLLER GMBH (AT) | 2005-10-13 | — | — | WO | claimed |
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | disclosed |
| CN-117858872-A | Heterocyclic EGFR inhibitors for the treatment of cancer | 缆图药品公司 | 2024-04-09 | — | — | CN | disclosed |
| CN-114341282-A | Curable composition for inkjet | 太阳油墨制造株式会社 | 2022-04-12 | — | — | CN | disclosed |
| CN-108290828-B | Oxime ester compound having excellent thermal stability, photopolymerization initiator containing the same, and photosensitive resin composition | 京仁洋行股份有限公司 | 2021-01-26 | — | — | CN | disclosed |
| CN-110872455-A | White resin composition, backlight unit and display device | 东友精细化工有限公司 | 2020-03-10 | — | — | CN | disclosed |
| US-9268218-B2 | Photosensitive resin composition for color filter and application thereof | CHI MEI CORPORATION (TW) | 2016-02-23 | — | — | US | disclosed |
| CN-105319847-A | Photosensitive resin composition for color filter and application thereof | CHI MEI CORP | 2016-02-10 | — | — | CN | disclosed |
| US-20080054171-A1 | Target for Laser Desorption/Ionisation Mass Spectrometry | PHYSIKALISCHES BURO STEINMULLER GMBH | 2008-03-06 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| WO-2007030849-A1 | METHOD FOR DETECTING ORGANIC COMPOUNDS | Austria Wirtschaftsservice Gesellschaft mit beschränkter Haftung (AT) | 2007-03-22 | — | — | WO | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |