SCHEMBL4859515

SCHEMBL4859515

CCC=CN1C(=O)C=CC1=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 14/20 0.42
ALDH1A1 P00352 3/20 0.42
BLM P54132 2/20 0.42
LMNA P02545 2/20 0.42
MAPT P10636 2/20 0.42
NPSR1 Q6W5P4 2/20 0.42
GMNN O75496 1/20 0.42
THPO P40225 1/20 0.42
PMP22 Q01453 1/20 0.42
GSK3A P49840 2/20 0.36
GSK3B P49841 2/20 0.36
FAAH O00519 5/20 0.35
PTGS1 P23219 3/20 0.34
PTGS2 P35354 3/20 0.34
HPGD P15428 2/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2C19 P33261 1/20 0.32
WRN Q14191 1/20 0.32
HIF1A Q16665 1/20 0.32
HSP90AA1 P07900 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10544878 1.00 MGLL (0.42) MGLLALDH1A1BLMLMNAMAPT
SCHEMBL2876847 0.76 MGLL (0.32) MGLLALDH1A1BLMLMNAMAPT
SCHEMBL28572221 0.76 MGLL (0.42) MGLLALDH1A1BLMLMNAMAPT
SCHEMBL2814265 0.76 MGLL (0.62) MGLLFAAHPTGS1PTGS2
SCHEMBL2814262 0.76 MGLL (0.62) MGLLFAAHPTGS1PTGS2
SCHEMBL2814738 0.76 MGLL (0.62) MGLLFAAHPTGS1PTGS2
SCHEMBL5245936 0.76 MGLL (0.62) MGLLFAAHPTGS1PTGS2
SCHEMBL20528097 0.75 MGLL (0.46) MGLLALDH1A1BLMLMNAMAPT
SCHEMBL487904 0.71 FAAH (0.38) MGLLALDH1A1FAAHHPGD
SCHEMBL28669956 0.70 DRD3 (0.41) ALDH1A1MAPTHPGDCYP1A2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
EP-1494072-A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR Corporation (JP) 2005-01-05 EP disclosed
US-20040265737-A1 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR CORPORATION (JP) 2004-12-30 US disclosed
US-6522852-B1 Image forming process using wet developing method RICOH COMPANY, LTD. (JP) 2003-02-18 US disclosed
CN-1047322-A Multilayer polymeric composition granule with the improved ionically-soluble polymkeric substance of one deck hydrophobicity ROHM & HAAS (US) 1990-11-28 CN disclosed