Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPRC | P08575 | 6/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.61 |
| ▸ | IDO1 | P14902 | 2/20 | 0.61 |
| ▸ | MEN1 | O00255 | 2/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.61 |
| ▸ | MAPT | P10636 | 2/20 | 0.61 |
| ▸ | HPGD | P15428 | 2/20 | 0.61 |
| ▸ | PTPN22 | Q9Y2R2 | 2/20 | 0.61 |
| ▸ | CES1 | P23141 | 2/20 | 0.61 |
| ▸ | LMNA | P02545 | 1/20 | 0.61 |
| ▸ | BCHE | P06276 | 1/20 | 0.61 |
| ▸ | POLB | P06746 | 1/20 | 0.61 |
| ▸ | THRB | P10828 | 1/20 | 0.61 |
| ▸ | PKM | P14618 | 1/20 | 0.61 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.61 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.61 |
| ▸ | ACHE | P22303 | 1/20 | 0.61 |
| ▸ | RECQL | P46063 | 1/20 | 0.61 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.61 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,2-Naphthoquinone SCHEMBL686745 | 0.88 | PTPRC (0.65) | PTPRCKDM4EIDO1MEN1KMT2A | |
| Naphthoquinone SCHEMBL9190925 | 0.85 | CDC25B (0.50) | PTPRCKDM4EIDO1MEN1KMT2A | |
| Naphthoquinone SCHEMBL2583577 | 0.85 | CDC25B (0.50) | PTPRCKDM4EIDO1MEN1KMT2A | |
| 1,2-Naphthoquinone SCHEMBL8434680 | 0.85 | PTPRC (0.61) | PTPRCKDM4EIDO1MEN1KMT2A | |
| 1,2-Naphthoquinone SCHEMBL3027885 | 0.85 | PTPRC (0.61) | PTPRCKDM4EIDO1MEN1KMT2A | |
| 1,2-Naphthoquinone SCHEMBL3027882 | 0.83 | PTPRC (0.54) | PTPRCKDM4EIDO1MEN1KMT2A | |
| 1,2-Naphthoquinone SCHEMBL29368763 | 0.82 | PTPRC (0.83) | PTPRCKDM4EIDO1MEN1KMT2A | |
| 1,2-Naphthoquinone SCHEMBL9225602 | 0.82 | PTPRC (0.83) | PTPRCKDM4EIDO1MEN1KMT2A | |
| 1,2-Naphthoquinone SCHEMBL5447857 | 0.80 | PTPRC (0.54) | PTPRCKDM4EIDO1MEN1KMT2A | |
| 1,2-Naphthoquinone SCHEMBL8376775 | 0.79 | PTPRC (0.53) | PTPRCKDM4EIDO1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108732868-B | Positive resist film laminate and pattern forming method | 信越化学工业株式会社 | 2022-12-13 | — | — | CN | claimed |
| US-9012122-B2 | Modified novolak phenolic resin, making method, and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-21 | — | — | US | claimed |
| EP-2586806-A2 | Modified novolak phenolic resin, making method, and resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-05-01 | — | — | EP | claimed |
| US-20130101937-A1 | MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-25 | — | — | US | claimed |
| US-7175960-B2 | photoresists comprising mixtures of alkali-soluble novolaks resin and phenolic compounds esterification with 1,2-naphthoquinonediazidosulfonic acid, having uniformity, high sensitivity and high resolution, and improved heat resistance, film retention, substrate adhesion, and storage stability | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-13 | — | — | US | claimed |
| US-4985333-A | PHOTORESISTS FOR SEMICONDUCTORS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1991-01-15 | — | — | US | claimed |
| JP-2287545-A | — | — | None | — | — | JP | disclosed |
| JP-3023455-A | — | — | None | — | — | JP | disclosed |
| JP-11030857-A | — | — | None | — | — | JP | disclosed |
| JP-3023454-A | — | — | None | — | — | JP | disclosed |
| JP-6095386-A | — | — | None | — | — | JP | disclosed |
| JP-8190194-A | — | — | None | — | — | JP | disclosed |
| JP-59193453-A | — | — | None | — | — | JP | disclosed |
| JP-H0323454-A | NOVEL POSITIVE TYPE PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO LTD | 1991-01-31 | — | — | JP | disclosed |
| JP-H0323455-A | NOVEL POSITIVE TYPE PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO LTD | 1991-01-31 | — | — | JP | disclosed |
| US-4985333-A | PHOTORESISTS FOR SEMICONDUCTORS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1991-01-15 | — | — | US | disclosed |
| JP-H02287545-A | POSITIVE TYPE PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO LTD | 1990-11-27 | — | — | JP | disclosed |
| JP-S59193453-A | IMAGE FORMING MATERIAL | RICOH CO LTD | 1984-11-02 | — | — | JP | disclosed |
| JP-H00323455-A | — | — | 0001-01-01 | — | — | JP | disclosed |
| JP-H00323454-A | — | — | 0001-01-01 | — | — | JP | disclosed |