Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPRC | P08575 | 5/20 | 0.65 |
| ▸ | PTPN1 | P18031 | 4/20 | 0.65 |
| ▸ | MEN1 | O00255 | 3/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.65 |
| ▸ | IDO1 | P14902 | 2/20 | 0.65 |
| ▸ | CES1 | P23141 | 2/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.65 |
| ▸ | MAPT | P10636 | 2/20 | 0.65 |
| ▸ | HPGD | P15428 | 2/20 | 0.65 |
| ▸ | PTPN22 | Q9Y2R2 | 2/20 | 0.65 |
| ▸ | LMNA | P02545 | 1/20 | 0.65 |
| ▸ | BCHE | P06276 | 1/20 | 0.65 |
| ▸ | POLB | P06746 | 1/20 | 0.65 |
| ▸ | THRB | P10828 | 1/20 | 0.65 |
| ▸ | PKM | P14618 | 1/20 | 0.65 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.65 |
| ▸ | ACHE | P22303 | 1/20 | 0.65 |
| ▸ | RECQL | P46063 | 1/20 | 0.65 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.65 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,2-Naphthoquinone SCHEMBL3027885 | 0.88 | PTPRC (0.61) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL8434680 | 0.88 | PTPRC (0.61) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL4860140 | 0.88 | PTPRC (0.61) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| Naphthoquinone SCHEMBL106247 | 0.84 | IDO1 (0.54) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL29368763 | 0.84 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL9225602 | 0.84 | PTPRC (0.83) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL5447857 | 0.83 | PTPRC (0.54) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL3027882 | 0.83 | PTPRC (0.54) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL8376775 | 0.82 | PTPRC (0.53) | PTPRCPTPN1MEN1KMT2AKDM4E | |
| 1,2-Naphthoquinone SCHEMBL9225610 | 0.81 | PTPRC (0.77) | PTPRCPTPN1MEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116836389-B | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116836389-A | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116149140-B | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-A | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-23 | — | — | CN | claimed |
| EP-2957955-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | SHINETSU CHEMICAL CO (JP) | 2018-06-06 | — | — | EP | claimed |
| US-9557645-B2 | Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-31 | — | — | US | claimed |
| US-20150370166-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-24 | — | — | US | claimed |
| EP-2957955-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-23 | — | — | EP | claimed |
| EP-1664928-B1 | POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO LTD (JP) | 2012-02-29 | — | — | EP | claimed |
| US-20060183048-A1 | Positive photoresist composition and resist pattern formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-08-17 | — | — | US | claimed |
| EP-1664928-A2 | POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-06-07 | — | — | EP | claimed |
| WO-2005029184-A2 | POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-03-31 | — | — | WO | claimed |
| JP-7253664-A | — | — | None | — | — | JP | disclosed |
| JP-10269521-A | — | — | None | — | — | JP | disclosed |
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| US-20010035343-A1 | Fine pattern forming method, developing/washing device used for the same, plating method using the same, and manufacturing method of thin film magnetic head using the same | TDK CORPORATION | 2001-11-01 | — | — | US | disclosed |
| JP-H10269521-A | FORMATION OF MAGNETIC POLE OF THIN-FILM MAGNETIC HEAD | TDK CORP | 1998-10-09 | — | — | JP | disclosed |
| JP-H07253664-A | PHOTOSENSITIVE RESIN COMPOSITION | SUMITOMO CHEM CO LTD | 1995-10-03 | — | — | JP | disclosed |