Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CDC25B | P30305 | 6/20 | 0.50 |
| ▸ | IDO1 | P14902 | 5/20 | 0.50 |
| ▸ | MAOA | P21397 | 4/20 | 0.50 |
| ▸ | PIN1 | Q13526 | 2/20 | 0.50 |
| ▸ | MAOB | P27338 | 2/20 | 0.50 |
| ▸ | SNCA | P37840 | 2/20 | 0.50 |
| ▸ | EHMT2 | Q96KQ7 | 2/20 | 0.50 |
| ▸ | AKT1 | P31749 | 1/20 | 0.50 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.50 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.50 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 9/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 9/20 | 0.37 |
| ▸ | MAPT | P10636 | 9/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.37 |
| ▸ | HPGD | P15428 | 5/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.37 |
| ▸ | THRB | P10828 | 4/20 | 0.37 |
| ▸ | RECQL | P46063 | 4/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthoquinone SCHEMBL9190925 | 1.00 | CDC25B (0.50) | CDC25BIDO1MAOAPIN1MAOB | |
| 1,2-Naphthoquinone SCHEMBL4860140 | 0.85 | PTPRC (0.61) | CDC25BIDO1MAOAPIN1MAOB | |
| Naphthoquinone SCHEMBL106247 | 0.85 | IDO1 (0.54) | CDC25BIDO1MAOAPIN1MAOB | |
| Naphthoquinone SCHEMBL2775074 | 0.82 | CDC25B (0.50) | CDC25BIDO1MAOAPIN1MAOB | |
| Naphthoquinone SCHEMBL27486918 | 0.80 | IDO1 (0.44) | CDC25BIDO1MAOAPIN1MAOB | |
| Naphthoquinone SCHEMBL10749866 | 0.79 | IDO1 (0.31) | CDC25BIDO1MAOAPIN1MAOB | |
| Naphthoquinone SCHEMBL27601003 | 0.78 | IDO1 (0.74) | CDC25BIDO1MAOAPIN1MAOB | |
| Naphthoquinone SCHEMBL10579011 | 0.78 | CDC25B (0.54) | CDC25BIDO1MAOAPIN1MAOB | |
| Naphthoquinone SCHEMBL10579010 | 0.78 | CDC25B (0.54) | CDC25BIDO1MAOAPIN1MAOB | |
| SCHEMBL5586196 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 168 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8492067-B2 | Positive lift-off resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-23 | — | — | US | claimed |
| EP-1616888-B1 | RESIN FOR UNDER-LAYER MATERIAL, UNDER-LAYER MATERIAL, LAMINATE AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2012-07-11 | — | — | EP | claimed |
| US-20060281029-A1 | Resin for under-layer material, under-layer material, laminate and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-12-14 | — | — | US | claimed |
| EP-1616888-A1 | RESIN FOR UNDER-LAYER MATERIAL, UNDER-LAYER MATERIAL, LAMINATE AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-18 | — | — | EP | claimed |
| US-6964838-B2 | Positive photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-11-15 | — | — | US | claimed |
| US-20040137359-A1 | Positive photoresist composition | TOKYO OHKA KOGYO CO., LTD. | 2004-07-15 | — | — | US | claimed |
| US-20020132178-A1 | Positive photoresist composition | TOKYO OHKA KOGYO CO., LTD. | 2002-09-19 | — | — | US | claimed |
| US-6265129-B1 | FORM A RESIST PATTERN THAT HAD A MICRO-GROOVE IN EACH ELEMENT AND WHICH YET WAS SATISFACTORY IN FEATURE PROFILE AND RESOLUTION. | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-24 | — | — | US | claimed |
| US-4791046-A | Process for forming mask patterns of positive type resist material with trimethylsilynitrile | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1988-12-13 | — | — | US | claimed |
| US-4686280-A | Positive type resist material with trimethylsilylnitrile | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1987-08-11 | — | — | US | claimed |
| JP-62035348-A | — | — | None | — | — | JP | disclosed |
| JP-62035347-A | — | — | None | — | — | JP | disclosed |
| JP-61159638-A | — | — | None | — | — | JP | disclosed |
| JP-6273929-A | — | — | None | — | — | JP | disclosed |
| JP-61159633-A | — | — | None | — | — | JP | disclosed |
| JP-S61159638-A | FORMATION OF RESIST PATTERN | OKI ELECTRIC IND CO LTD | 1986-07-19 | — | — | JP | disclosed |
| EP-0154980-A1 | Negative working light-sensitive lithographic plate requiring no dampening solution and plate making process | FUJI PHOTO FILM CO., LTD. (JP) | 1985-09-18 | — | — | EP | disclosed |
| JP-S06235347-A | — | — | 0001-01-01 | — | — | JP | disclosed |
| JP-S06235348-A | — | — | 0001-01-01 | — | — | JP | disclosed |
| JP-H00426850-A | — | — | 0001-01-01 | — | — | JP | disclosed |