⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL2024982 | 1.00 | — | — | |
| Fluoride SCHEMBL3142094 | 1.00 | — | — | |
| Fluoride SCHEMBL10832632 | 1.00 | — | — | |
| Fluoride SCHEMBL8205054 | 1.00 | — | — | |
| Fluoride SCHEMBL21058049 | 1.00 | — | — | |
| Fluoride SCHEMBL9147662 | 1.00 | — | — | |
| Fluoride SCHEMBL259811 | 1.00 | — | — | |
| Fluoride SCHEMBL6318587 | 1.00 | — | — | |
| Fluoride SCHEMBL971782 | 1.00 | — | — | |
| Fluoride SCHEMBL2024981 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107573531-A | A kind of hot pressing processing method of the super-hydrophobic cylindrical-array of large scale of drop pie spring | 大连理工大学 | 2018-01-12 | — | — | CN | claimed |
| JP-2138759-A | — | — | None | — | — | JP | disclosed |
| CN-117295343-A | Perovskite solar cell with high electrical stability and preparation method thereof | 中南大学 | 2023-12-26 | — | — | CN | disclosed |
| CN-113325517-B | Optical fiber end cap and optical fiber laser | 中国工程物理研究院激光聚变研究中心 | 2021-10-15 | — | — | CN | disclosed |
| CN-113325517-A | Optical fiber end cap and optical fiber laser | 中国工程物理研究院激光聚变研究中心 | 2021-08-31 | — | — | CN | disclosed |
| CN-112158850-A | Method for preparing anhydrous silicon tetrafluoride and hydrogen fluoride mixed gas by using phosphorus ore associated fluorine | 湖北祥云(集团)化工股份有限公司 | 2021-01-01 | — | — | CN | disclosed |
| CN-106596429-B | The measuring method of silica in fluorine-containing sample | 攀钢集团江油长城特殊钢有限公司 | 2019-11-15 | — | — | CN | disclosed |
| CN-103374188-B | The reinforcing fluoropolymer compound of the nano micro crystal cellulose containing functionalisation of surfaces | 施乐公司 | 2017-10-03 | — | — | CN | disclosed |
| CN-103374189-B | The method for preparing the reinforcing fluoropolymer compound of the nano micro crystal cellulose containing functionalisation of surfaces | 施乐公司 | 2017-07-14 | — | — | CN | disclosed |
| CN-106596429-A | Method for measuring silicon dioxide in fluorine-containing samples | 攀钢集团江油长城特殊钢有限公司 | 2017-04-26 | — | — | CN | disclosed |
| US-20060120023-A1 | Solid electrolytic capactitor and method for manufacturing solid electrolytic capacitor | TDK CORPORATION (JP) | 2006-06-08 | — | — | US | disclosed |
| US-20060109609-A1 | Solid electrolytic capacitor and a method for manufacturing a solid electrolytic capacitor | TDK CORPORATION (JP) | 2006-05-25 | — | — | US | disclosed |
| US-6999303-B2 | Solid electrolytic capacitor and process for its fabrication | TDK CORPORATION (JP) | 2006-02-14 | — | — | US | disclosed |
| US-6989982-B2 | Solid electrolytic capacitor, circuit board having built-in solid electrolytic capacitor and methods for manufacturing them | TDK CORPORATION (JP) | 2006-01-24 | — | — | US | disclosed |
| US-20050225930-A1 | SOLID ELECTROLYTIC CAPACITOR, BOARD WITH BUILT-IN SOLID ELECTROLYTIC CAPACITOR, AND METHOD FOR PRODUCING THEM | TDK CORPARATION (JP) | 2005-10-13 | — | — | US | disclosed |
| US-20050219802-A1 | Electrolytic capacitor and method of manufacturing the same | TDK CORPORATION (JP) | 2005-10-06 | — | — | US | disclosed |
| US-20050128685-A1 | Solid electrolytic capacitor and process for its fabrication | TDK CORPORATION | 2005-06-16 | — | — | US | disclosed |
| US-6346476-B1 | Method for enhancing line-to-line capacitance uniformity of plasma enhanced chemical vapor deposited (PECVD) inter-metal dielectric (IMD) layers | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2002-02-12 | — | — | US | disclosed |
| CN-1066698-C | Process for preparing perfluorocarbons | E I DU PONT DE NUMOURS AND CO (US) | 2001-06-06 | — | — | CN | disclosed |
| JP-H02138759-A | VAPOR PHASE GROWTH OF ALKALINE EARTH METAL FLUORIDE | FUJI ELECTRIC CO LTD | 1990-05-28 | — | — | JP | disclosed |