⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL2024982 | 1.00 | — | — | |
| Fluoride SCHEMBL3142094 | 1.00 | — | — | |
| Fluoride SCHEMBL10832632 | 1.00 | — | — | |
| Fluoride SCHEMBL8205054 | 1.00 | — | — | |
| Fluoride SCHEMBL4861337 | 1.00 | — | — | |
| Fluoride SCHEMBL21058049 | 1.00 | — | — | |
| Fluoride SCHEMBL9147662 | 1.00 | — | — | |
| Fluoride SCHEMBL259811 | 1.00 | — | — | |
| Fluoride SCHEMBL971782 | 1.00 | — | — | |
| Fluoride SCHEMBL2024981 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106733547-A | A kind of preparation method of wear-resisting super-hydrophobic metal surface | 西安理工大学 | 2017-05-31 | — | — | CN | disclosed |
| CN-102405251-B | Based on the aqueous silane system and uses thereof of three (alkoxysilylalkyl) amine | EVONIK DEGUSSA GMBH (DE) | 2015-11-25 | — | — | CN | disclosed |
| CN-101309981-B | Mixed silanes | NANOGATE AG | 2012-03-21 | — | — | CN | disclosed |
| US-6979656-B2 | Carbon and halogen doped silicate glass dielectric layer and method for fabricating the same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2005-12-27 | — | — | US | disclosed |
| US-20050121751-A1 | Carbon and halogen doped silicate glass dielectric layer and method for fabricating the same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. | 2005-06-09 | — | — | US | disclosed |
| US-6136685-A | VAPOR DEPOSITING A PLASMA GENERATED BY A RADIO FREQUENCY BIAS POWER WITH A RADIO FREQUENCY SOURCE GENERATOR | APPLIED MATERIALS, INC. (US) | 2000-10-24 | — | — | US | disclosed |