⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL2024982 | 1.00 | — | — | |
| Fluoride SCHEMBL3142094 | 1.00 | — | — | |
| Fluoride SCHEMBL10832632 | 1.00 | — | — | |
| Fluoride SCHEMBL8205054 | 1.00 | — | — | |
| Fluoride SCHEMBL4861337 | 1.00 | — | — | |
| Fluoride SCHEMBL21058049 | 1.00 | — | — | |
| Fluoride SCHEMBL9147662 | 1.00 | — | — | |
| Fluoride SCHEMBL259811 | 1.00 | — | — | |
| Fluoride SCHEMBL6318587 | 1.00 | — | — | |
| Fluoride SCHEMBL2024981 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12513952-B2 | Method for fabricating a semiconductor device including etching nanostructures | Taiwan Semiconducor Manufacturing Company, Ltd. (TW) | 2025-12-30 | — | — | US | claimed |
| CN-116314670-A | Cerium-doped amorphous carbon coated silicon-carbon composite material prepared by silane cracking method and application thereof | 内蒙古欣源石墨烯科技股份有限公司 | 2023-06-23 | — | — | CN | claimed |
| US-20230027676-A1 | Semiconductor Devices with Uniform Gate Regions | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-01-26 | — | — | US | claimed |
| US-20050103438-A1 | Use of light emitting chemical reactions for control of semiconductor production processes | THE BOC GROUP PLC. (GB) | 2005-05-19 | — | — | US | claimed |
| EP-1485937-A2 | USE OF LIGHT EMITTING CHEMICAL REACTIONS FOR CONTROL OF SEMICONDUCTOR PRODUCTION PROCESSES | The BOC Group plc (GB) | 2004-12-15 | — | — | EP | claimed |
| WO-2003079411-A2 | USE OF LIGHT EMITTING CHEMICAL REACTIONS FOR CONTROL OF SEMICONDUCTOR PRODUCTION PROCESSES | THE BOC GROUP PLC (GB) | 2003-09-25 | — | — | WO | claimed |
| CN-1124920-A | oral composition | PROCTER & GAMBLE (US) | 1996-06-19 | — | — | CN | claimed |
| US-5178847-A | PROCESS FOR PRODUCING CERAMIC RAW MATERIALS | KEMIRA OY (FI) | 1993-01-12 | — | — | US | claimed |
| EP-0334791-A1 | Process for the preparation of silicon nitride | UNION EXPLOSIVOS RIO TINTO, S.A. (ES) | 1989-09-27 | — | — | EP | claimed |
| US-4138509-A | Silicon purification process | MOTOROLA, INC. (US) | 1979-02-06 | — | — | US | claimed |
| US-4070444-A | Low cost, high volume silicon purification process | MOTOROLA INC. (US) | 1978-01-24 | — | — | US | claimed |
| US-3969163-A | Vapor deposition method of forming low cost semiconductor solar cells including reconstitution of the reacted gases | TEXAS INSTRUMENTS INCORPORATED (US) | 1976-07-13 | — | — | US | claimed |
| JP-6168895-A | — | — | None | — | — | JP | disclosed |
| JP-6287011-A | — | — | None | — | — | JP | disclosed |
| JP-6287011-A | — | — | None | — | — | JP | disclosed |
| JP-7014781-A | — | — | None | — | — | JP | disclosed |
| US-4070444-A | Low cost, high volume silicon purification process | MOTOROLA INC. (US) | 1978-01-24 | — | — | US | disclosed |
| US-4070444-A | Low cost, high volume silicon purification process | MOTOROLA INC. (US) | 1978-01-24 | — | — | US | disclosed |
| US-3969163-A | Vapor deposition method of forming low cost semiconductor solar cells including reconstitution of the reacted gases | TEXAS INSTRUMENTS INCORPORATED (US) | 1976-07-13 | — | — | US | disclosed |
| US-3969163-A | Vapor deposition method of forming low cost semiconductor solar cells including reconstitution of the reacted gases | TEXAS INSTRUMENTS INCORPORATED (US) | 1976-07-13 | — | — | US | disclosed |