SCHEMBL4862437

SCHEMBL4862437

C=C(O)C(=O)O.OCC(CO)(CO)COCC(CO)(CO)CO

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39
TP53 P04637 1/20 0.39
CYP3A4 P08684 1/20 0.39
MAPK1 P28482 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HIF1A Q16665 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Oxalic Acid SCHEMBL28077223 0.87 ALDH1A1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL4614161 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL215990 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL194261 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL9170487 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL59117 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL59223 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL218040 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL1655579 0.86 ALDH1A1 (0.36) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL6152495 0.85 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7402376-B2 Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2008-07-22 US disclosed
US-20050238998-A1 Photosensitive resin composition and photosensitive dry film containing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2005-10-27 US disclosed
US-6291068-B1 CORES WITH COATING LAYER, AMMONIUM POLYPHOSPHATE AND THERMOSETTING RESIN, MELAMINE MONOMER OR SURFACE TREATED LAYER CHISSO CORPORATION (JP) 2001-09-18 US disclosed
EP-0924166-A1 THERMOPLASTIC-COATED AMMONIUM POLYPHOSPHATE AND PROCESS FOR THE PREPARATION THEREOF CHISSO CORPORATION (JP) 1999-06-23 EP disclosed
EP-0322585-A2 Improved photopolymerizable imaging materials DU PONT DE NEMOURS (DEUTSCHLAND) GMBH (DE) 1989-07-05 EP disclosed