Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27402229 | 0.86 | ALDH1A1 (0.34) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL157314 | 0.86 | ALDH1A1 (0.32) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Acetic Acid SCHEMBL2578978 | 0.81 | FFAR3 (0.37) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Acetic Acid SCHEMBL10338274 | 0.81 | FFAR3 (0.37) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Acetic Acid SCHEMBL11542884 | 0.81 | FFAR3 (0.37) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Acetic Acid SCHEMBL813643 | 0.81 | FFAR3 (0.37) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL4866255 | 0.80 | ALDH1A1 (0.38) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Oxalic Acid SCHEMBL28077223 | 0.79 | ALDH1A1 (0.38) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Methacrylic Acid SCHEMBL218040 | 0.78 | ALDH1A1 (0.36) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Methacrylic Acid SCHEMBL9170487 | 0.78 | ALDH1A1 (0.36) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7402376-B2 | Photosensitive resin composition and photosensitive dry film containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20050238998-A1 | Photosensitive resin composition and photosensitive dry film containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |