SCHEMBL4866823

SCHEMBL4866823

C=COC(=O)C1(C(=O)OC=C)CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4866822 0.90 CYP2C19 (0.32)
SCHEMBL29197931 0.88 CYP2C19 (0.31)
SCHEMBL814977 0.80 KDM4E (0.31)
SCHEMBL2005167 0.78 FFAR3 (0.36)
SCHEMBL6257265 0.77
SCHEMBL9656044 0.74
SCHEMBL27259331 0.72 MEN1 (0.30)
SCHEMBL427161 0.72 ALDH1A1 (0.36)
SCHEMBL20183938 0.72 ALDH1A1 (0.36)
SCHEMBL10412000 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10000648-B2 Photo-curable ink composition HP SCITEX LTD. (IL) 2018-06-19 US claimed
EP-2764063-B1 PHOTO-CURABLE INK COMPOSITION HP SCITEX LTD (IL) 2018-01-24 EP claimed
US-20140249243-A1 PHOTO-CURABLE INK COMPOSITION HP SCITEX LTD. (IL) 2014-09-04 US claimed
EP-2764063-A1 PHOTO-CURABLE INK COMPOSITION Hewlett-Packard Industrial Printing Ltd. (IL) 2014-08-13 EP claimed
WO-2013054317-A1 PHOTO-CURABLE INK COMPOSITION HEWLETT-PACKARD INDUSTRIAL PRINTING LTD. (IL) 2013-04-18 WO claimed
US-10000648-B2 Photo-curable ink composition HP SCITEX LTD. (IL) 2018-06-19 US disclosed
US-9969902-B2 Mill base composition and UV curable ink composition comprising same HP SCITEX LTD (IL) 2018-05-15 US disclosed
EP-2764063-B1 PHOTO-CURABLE INK COMPOSITION HP SCITEX LTD (IL) 2018-01-24 EP disclosed
US-9815314-B2 Methods for printing articles HEWLETT-PACKARD INDUSTRIAL PRINTING LTD. (IL) 2017-11-14 US disclosed
US-20170306179-A9 MILL BASE COMPOSITION AND UV CURABLE INK COMPOSITION COMPRISING SAME HP SCITEX LTD. (IL) 2017-10-26 US disclosed
US-20170015853-A1 MILL BASE COMPOSITION AND UV CURABLE INK COMPOSITION COMPRISING SAME HEWLETT-PACKARD IND PRINTING LTD (IL) 2017-01-19 US disclosed
US-9534085-B2 Ene-thiol-type curable composition and cured product thereof SHOWA DENKO K.K. (JP) 2017-01-03 US disclosed
WO-2013054317-A1 PHOTO-CURABLE INK COMPOSITION HEWLETT-PACKARD INDUSTRIAL PRINTING LTD. (IL) 2013-04-18 WO disclosed
WO-2012140639-A1 MILL BASE COMPOSITION AND UV CURABLE INK COMPOSITION COMPRISING SAME HEWLETT-PACKARD INDUSTRIAL PRINTING LTD. (IL) 2012-10-18 WO disclosed
US-7417100-B2 Transparent fluorine-containing copolymer CENTRAL GLASS COMPANY, LIMITED (JP) 2008-08-26 US disclosed
US-20060063902-A1 Transparent fluorine-containing copolymer CENTRAL GLASS CO., LTD. (JP) 2006-03-23 US disclosed
US-5986150-A FLUOROPOLYMERS FROM COMPOUNDS WITH OLEFIN AND EPOXY OR HYDROXY GROUPS DAIKIN INDUSTRIES, LTD. (JP) 1999-11-16 US disclosed
EP-0728776-B1 FLUOROOLEFIN, FLUOROPOLYMER, AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE POLYMER DAIKIN IND LTD (JP) 1998-10-07 EP disclosed
US-5670593-A Fluorine-containing olefin, fluorine-containing polymer and thermoplastic resin composition prepared by using said polymer DAIKIN INDUSTRIES, LTD. (JP) 1997-09-23 US disclosed
EP-0728776-A1 FLUOROOLEFIN, FLUOROPOLYMER, AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE POLYMER DAIKIN INDUSTRIES, LIMITED (JP) 1996-08-28 EP disclosed