Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 5/20 | 0.34 |
| ▸ | CA2 | P00918 | 5/20 | 0.34 |
| ▸ | CA12 | O43570 | 2/20 | 0.34 |
| ▸ | CA7 | P43166 | 2/20 | 0.34 |
| ▸ | CA13 | Q8N1Q1 | 2/20 | 0.34 |
| ▸ | F2 | P00734 | 1/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.32 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.32 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.31 |
| ▸ | MMP2 | P08253 | 1/20 | 0.31 |
| ▸ | MMP9 | P14780 | 1/20 | 0.31 |
| ▸ | MMP8 | P22894 | 1/20 | 0.31 |
| ▸ | MMP13 | P45452 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28014914 | 0.76 | ALDH1A1 (0.40) | CA1CA2CA12CA7CA13 | |
| SCHEMBL27865960 | 0.71 | CA1 (0.44) | CA1CA2CA12CA7CA13 | |
| SCHEMBL15353250 | 0.67 | CA1 (0.43) | CA1CA2CA12CA7CA13 | |
| SCHEMBL2267504 | 0.67 | CA1 (0.43) | CA1CA2CA12CA7CA13 | |
| SCHEMBL15173534 | 0.67 | CA1 (0.41) | CA1CA2CA12CA7CA13 | |
| SCHEMBL778901 | 0.66 | ALDH1A1 (0.30) | — | |
| SCHEMBL6115331 | 0.66 | CA1 (0.48) | CA1CA2CA12CA7CA13 | |
| SCHEMBL14778137 | 0.65 | PSIP1 (0.48) | CA1CA2CA12CA7CA13 | |
| SCHEMBL6229260 | 0.64 | ALDH1A1 (0.48) | MMP9 | |
| SCHEMBL14779949 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7465528-B2 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |