Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4871760 | 0.84 | TSHR (0.58) | TSHRALDH1A1EPHX1NPSR1THRB | |
| SCHEMBL4872026 | 0.74 | TSHR (0.40) | TSHRALDH1A1EPHX1NPSR1 | |
| SCHEMBL9063791 | 0.74 | TSHR (0.63) | TSHRALDH1A1THRB | |
| SCHEMBL8407099 | 0.73 | TSHR (0.44) | TSHRALDH1A1EPHX1NPSR1THRB | |
| SCHEMBL23493892 | 0.72 | TSHR (0.56) | TSHRALDH1A1EPHX1NPSR1THRB | |
| SCHEMBL7161388 | 0.71 | TSHR (0.50) | TSHRALDH1A1EPHX1NPSR1THRB | |
| SCHEMBL3873065 | 0.71 | TSHR (0.48) | TSHRALDH1A1THRB | |
| SCHEMBL23494218 | 0.71 | TSHR (0.39) | TSHRALDH1A1EPHX1NPSR1 | |
| SCHEMBL28579912 | 0.70 | TSHR (0.36) | TSHRALDH1A1EPHX1NPSR1 | |
| SCHEMBL16913019 | 0.70 | TP53 (0.40) | TSHRALDH1A1EPHX1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | claimed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | claimed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | claimed |
| US-9897729-B2 | Photosensitive resin composition for color filter and application thereof | CHI MEI CORPORATION (TW) | 2018-02-20 | — | — | US | disclosed |
| US-20150315376-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2015-11-05 | — | — | US | disclosed |
| CN-100538517-C | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2009-09-09 | — | — | CN | disclosed |
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | disclosed |
| CN-1781057-A | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2006-05-31 | — | — | CN | disclosed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | disclosed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | disclosed |