SCHEMBL4876094

SCHEMBL4876094

CNCCc1c2ccccc2cc2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
CHRNB2 P17787 5/20 0.47
CHRNA7 P36544 5/20 0.47
CHRNA4 P43681 5/20 0.47
TAAR1 Q96RJ0 6/20 0.47
ATM Q13315 1/20 0.47
HRH3 Q9Y5N1 1/20 0.44
ALDH1A1 P00352 2/20 0.43
KDM4E B2RXH2 1/20 0.43
HTR1A P08908 1/20 0.43
HTT P42858 1/20 0.43
HTR1D P28221 1/20 0.43
HTR1B P28222 1/20 0.43
LMNA P02545 1/20 0.43
ALOX15 P16050 1/20 0.43
SLC6A4 P31645 2/20 0.42
HRH1 P35367 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9445712 0.80 HTR2A (0.65) HTR2AL3MBTL1TAAR1ALDH1A1KDM4E
SCHEMBL9666555 0.79 CYP1A2 (0.47) CHRNB2CHRNA7CHRNA4TAAR1ATM
SCHEMBL713198 0.79 HTR2A (0.54) HTR2AL3MBTL1ALDH1A1KDM4EHTR1D
SCHEMBL29494584 0.79 HTR2A (0.54) HTR2AL3MBTL1ALDH1A1KDM4EHTR1D
Hydrochloric Acid SCHEMBL9665572 0.78 CYP1A2 (0.46) CHRNB2CHRNA7CHRNA4TAAR1ATM
SCHEMBL10823801 0.77 L3MBTL1 (0.68) HTR2AL3MBTL1ALDH1A1KDM4E
SCHEMBL7915225 0.77 ALDH1A1 (0.61) HTR2AL3MBTL1ATMALDH1A1KDM4E
SCHEMBL7875750 0.76 HTR2A (0.60) HTR2AL3MBTL1ALDH1A1KDM4E
SCHEMBL7877776 0.76 HTR2A (0.60) HTR2AL3MBTL1TAAR1ALDH1A1KDM4E
SCHEMBL4101924 0.75 SLC6A4 (0.45) HTR2AL3MBTL1SLC6A4HRH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1831648-B Positive photosensitive resin composition NITTO DENKO CORP 2011-06-15 CN disclosed
US-7371506-B2 Positive photosensitive resin composition NITTO DENKO CORPORATION (JP) 2008-05-13 US disclosed
EP-1701210-A1 Positive photosensitive resin composition Nitto Denko Corporation (JP) 2006-09-13 EP disclosed
CN-1831648-A Positive photosensitive resin composition NITTO DENKO CORP (JP) 2006-09-13 CN disclosed
US-20060199102-A1 Positive photosensitive resin composition NITTO DENKO CORPORATION 2006-09-07 US disclosed