SCHEMBL487648

SCHEMBL487648

FCC(F)C(F)C(F)C(F)F.[BiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1218128 0.97
SCHEMBL489002 0.93
Fluoride SCHEMBL28360298 0.93
SCHEMBL3248535 0.93
SCHEMBL9131975 0.93
SCHEMBL7703497 0.93
SCHEMBL1024180 0.93
SCHEMBL1022557 0.93
SCHEMBL9155181 0.93
SCHEMBL14450818 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8486487-B2 Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film KONICA MINOLTA HOLDINGS, INC. (JP) 2013-07-16 US disclosed
EP-2180019-B1 Resin composition, method of its composition, and cured formulation NIPPON CATALYTIC CHEM IND (JP) 2012-02-01 EP disclosed
US-8062707-B2 Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film KONICA MINOLTA HOLDINGS, INC. (JP) 2011-11-22 US disclosed
US-7723407-B2 mixing a phenolic compound containing the inorganic microfine particle(SiO2) and a compound containing at least one of the glycidyl group and/or an epoxy group containing the inorganic microfine particle; fireproofing; good mechanical properties; heat resistance; automobiles, construction, electronics NIPPON SHOKUBAI CO., LTD. (JP) 2010-05-25 US disclosed
EP-2180019-A1 Resin composition, method of its composition, and cured formulation Nippon Shokubai Co., Ltd. (JP) 2010-04-28 EP disclosed
EP-1626065-B1 Resin composition, method of its composition, and cured formulation NIPPON CATALYTIC CHEM IND (JP) 2010-01-20 EP disclosed
US-20090109536-A1 PLASTIC OPTICAL ELEMENT WITH GAS BARRIER FILM, ITS MANUFACTURING METHOD AND OPTICAL PICKUP DEVICE EMPLOYING THE ELEMENT KONICA MINOLTA HOLDINGS, INC. (JP) 2009-04-30 US disclosed
US-20090051272-A1 GAS BARRIER FILM, GAS BARRIER FILM MANUFACTURING METHOD, RESIN SUBSTRATE FOR ORGANIC ELECTROLUMINESCENT DEVICE USING THE AFORESAID GAS BARRIER FILM, AND ORGANIC ELECTROLUMINESCENT DEVICE USING THE AFOREMENTIONED GAS BARRIER FILM KONICA MINOLTA HOLDINGS, INC. (JP) 2009-02-26 US disclosed
EP-1849593-A1 GAS-BARRIER FILM, PROCESS FOR PRODUCING GAS-BARRIER FILM, RESIN BASE WITH THE GAS-BARRIER FILM FOR ORGANIC ELECTROLUMINESCENT ELEMENT, AND ORGANIC ELECTROLUMINESCENT ELEMENT KONICA MINOLTA HOLDINGS, INC. (JP) 2007-10-31 EP disclosed
EP-1626065-A1 Resin composition, method of its composition, and cured formulation Nippon Shokubai Co., Ltd. (JP) 2006-02-15 EP disclosed
US-20060029811-A1 mixing a phenolic compound containing the inorganic microfine particle(SiO2) and a compound containing at least one of the glycidyl group and/or an epoxy group containing the inorganic microfine particle; fireproofing; good mechanical properties; heat resistance; automobiles, construction, electronics NIPPON SHOKUBAI CO., LTD. (JP) 2006-02-09 US disclosed