SCHEMBL4876889

SCHEMBL4876889

O=S(=O)(O)O[As](=O)(O)F.O=[As](O)(F)Oc1ccccc1.O=[As](O)(F)Oc1ccccc1.O=[As](O)(F)Oc1ccccc1.O=[As](O)(O)F.O=[As](O)(O)F

nearest known ligand 0.33

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA9 Q16790 2/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
TSHR P16473 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CA4 P22748 1/20 0.31
CA6 P23280 1/20 0.31
CA7 P43166 1/20 0.31
CA14 Q9ULX7 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2001538 0.86 CA4 (0.41) CA9CA1CA2TSHRCA4
SCHEMBL808465 0.79 CA4 (0.38) CA9TSHRSMN1; SMN2CA4CA6
SCHEMBL2064518 0.67 CA4 (0.46) CA9CA1CA2TSHRCA4
SCHEMBL367452 0.67 CA4 (0.46) CA9CA1CA2TSHRCA4
SCHEMBL16563260 0.66 TSHR (0.73) CA9CA1CA2TSHRSMN1; SMN2
SCHEMBL138895 0.63 CA2 (0.58) CA9CA1CA2TSHRSMN1; SMN2
SCHEMBL15477270 0.62 CA4 (0.52) CA9CA1CA2TSHRCA4
SCHEMBL28278624 0.62 CA4 (0.41) CA9CA1CA2TSHRCA4
SCHEMBL712975 0.62 LTA4H (0.45) CA9CA1CA2TSHRCA4
Ammonia Solution, Strong SCHEMBL1115426 0.61 CA1 (0.56) CA9CA1CA2TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7338737-B2 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-04 US disclosed
US-7297452-B2 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-11-20 US disclosed
US-20070254221-A1 Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. SAMSUNG DISPLAY CO., LTD. (KR) 2007-11-01 US disclosed
US-20060141393-A1 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. 2006-06-29 US disclosed
US-20060131267-A1 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG DISPLAY CO., LTD. (KR) 2006-06-22 US disclosed