SCHEMBL488039

SCHEMBL488039

BOCCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27479641 0.97
SCHEMBL4556157 0.90
SCHEMBL12760684 0.87 THRB (0.50)
SCHEMBL10940757 0.87
SCHEMBL28160682 0.87
SCHEMBL7164575 0.87
SCHEMBL17009071 0.87 THRB (0.50)
SCHEMBL13551004 0.87 THRB (0.50)
SCHEMBL27868483 0.87 THRB (0.50)
SCHEMBL7923601 0.82 TSHR (0.52)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108530491-A A kind of preparation method of the second dione dioxime cobalt complex of difluoro boryl bridge joint 广州立邦涂料有限公司 2018-09-14 CN claimed
US-6891004-B2 Transition metal catalyst component for polymerization, and method for producing a polymer by means thereof DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2005-05-10 US claimed
CN-119587384-A Dental ceramic prosthesis and surface modification material thereof 嘉兴市京吟生物科技有限公司 2025-03-11 CN disclosed
CN-112526822-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2025-02-28 CN disclosed
CN-112286000-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-12-03 CN disclosed
CN-118750637-A Porous hard tissue adhesive and preparation method thereof 广东中康英飞生物科技有限公司 2024-10-11 CN disclosed
CN-118718072-A Acrylic-based hard tissue adhesive and preparation method thereof 广东中康英飞生物科技有限公司 2024-10-01 CN disclosed
CN-118620392-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-09-10 CN disclosed
CN-114660896-B Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2024-06-11 CN disclosed
CN-116284087-B Method for preparing high-purity butoxy dibutyl boron 嘉兴市京吟生物科技有限公司 2023-10-27 CN disclosed
CN-111458980-B Composition for forming underlayer film of silicon-containing resist and method for forming pattern 信越化学工业株式会社 2023-08-11 CN disclosed
EP-0504744-B1 Method for producing a stereospecific polyolefin TOSOH CORP (JP) 1996-07-17 EP disclosed
CN-1116850-A Optically active beta-aminoalkoxyborane complexes NISSAN CHEMICAL IND LTD (JP) 1996-02-14 CN disclosed
US-5244989-A METHOD FOR PRODUCING A STEREOSPECIFIC POLYOLEFIN TOSOH CORPORATION (JP) 1993-09-14 US disclosed
US-5112927-A Coordination Catalyst TOSOH CORPORATION (JP) 1992-05-12 US disclosed
EP-0376145-A2 Method for producing a stereoregular polyolefin Tosoh Corporation (JP) 1990-07-04 EP disclosed
US-4927553-A LUBRICANT CONTAINING BORONATED PHENOLIC ANTIOXIDANT AND ANTI-HAZE DIOL ETHYL CORPORATION (US) 1990-05-22 US disclosed
US-4623360-A ANTICOKING, ORGANIC NITRATES AND BORATED PHENOLIC COMPOUND ETHYL CORPORATION (US) 1986-11-18 US disclosed
EP-0175180-A1 Histargin-related compounds, a process for their preparation and their use as medicaments MICROBIAL CHEMISTRY RESEARCH FOUNDATION (JP) 1986-03-26 EP disclosed
US-4381345-A Pretreatment of glucose feedstock with reducing agents UOP INC. (US) 1983-04-26 US disclosed