SCHEMBL4881268

SCHEMBL4881268

Oc1ccccc1C=Cc1ccc2ccccc2[n+]1CCI

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 5/20 0.42
BCHE P06276 1/20 0.42
HTT P42858 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
MAPT P10636 1/20 0.41
PKM P14618 1/20 0.41
MAPK1 P28482 1/20 0.41
RAD52 P43351 1/20 0.41
ECE2 P0DPD6 2/20 0.40
KMT2A Q03164 6/20 0.39
POLB P06746 4/20 0.39
MEN1 O00255 3/20 0.39
RAB9A P51151 2/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
PPARG P37231 1/20 0.39
BLM P54132 1/20 0.39
NCOA2 Q15596 1/20 0.39
NCOA1 Q15788 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Perchlorate SCHEMBL4886019 0.78 KMT2A (0.42) ACHEBCHEHTTSMN1; SMN2NPSR1
SCHEMBL12866135 0.75 KMT2A (0.52) ACHEBCHEHTTSMN1; SMN2NPSR1
Perchlorate SCHEMBL4882609 0.71 ACHE (0.58) ACHEBCHEHTTSMN1; SMN2NPSR1
Perchlorate SCHEMBL4882628 0.71 ACHE (0.58) ACHEBCHEHTTSMN1; SMN2NPSR1
Perchlorate SCHEMBL4887190 0.70 ECE2 (0.43) ACHEBCHEHTTSMN1; SMN2NPSR1
Perchlorate SCHEMBL4887197 0.70 ECE2 (0.43) ACHEBCHEHTTSMN1; SMN2NPSR1
SCHEMBL4881276 0.67 MAPT (0.37) ACHEBCHEHTTSMN1; SMN2NPSR1
SCHEMBL717976 0.66 TRPA1 (0.76) BCHEHTTSMN1; SMN2NPSR1MAPT
SCHEMBL108389 0.66 TRPA1 (0.76) BCHEHTTSMN1; SMN2NPSR1MAPT
SCHEMBL12866035 0.65 KMT2A (0.47) ACHEBCHEHTTSMN1; SMN2NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080171440-A1 Pre-polishing treatment solution for interconnect substrate, polishing method, and method and apparatus for manufacturing interconnect substrate EBARA CORPORATION (JP) 2008-07-17 US disclosed