SCHEMBL4882231

SCHEMBL4882231

C=CCC(COCC)(Oc1ccccc1)S(=O)(=O)O

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
HTT P42858 1/20 0.33
MAPT P10636 1/20 0.32
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
MMP1 P03956 1/20 0.32
MMP9 P14780 1/20 0.32
MMP13 P45452 1/20 0.32
SMN1; SMN2 Q16637 4/20 0.30
ATM Q13315 1/20 0.30
KDM4E B2RXH2 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27641851 0.86 ALDH1A1 (0.38) ALDH1A1TSHRHTTMAPTMEN1
SCHEMBL8761669 0.77 MAPT (0.38) ALDH1A1TSHRHTTMAPTMEN1
SCHEMBL4055171 0.76 ALDH1A1 (0.39) ALDH1A1TSHRHTTMAPTMEN1
Sulfuric Acid SCHEMBL11626920 0.73 MAPT (0.42) ALDH1A1TSHRHTTMAPTMEN1
SCHEMBL9116134 0.69 PPARG (0.30)
SCHEMBL9769739 0.68
SCHEMBL27615337 0.68 HTT (0.33) ALDH1A1TSHRHTTMAPTATM
SCHEMBL10449497 0.67 MAPT (0.41) ALDH1A1TSHRHTTMAPTMEN1
SCHEMBL10903534 0.67 ALDH1A1 (0.46) ALDH1A1TSHRHTTMAPTMEN1
SCHEMBL1811048 0.66 MAPT (0.47) ALDH1A1TSHRHTTMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7465533-B2 Photothermographic material and an image forming method FUJIFILM CORPORPORATION (JP) 2008-12-16 US disclosed
US-7396639-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 US disclosed
US-20070178417-A1 Photothermographic material and an image forming method FUJIFILM CORPORATION (JP) 2007-08-02 US disclosed
US-7238467-B2 Silver halide emulsion, method of preparing the same and silver halide photosensitive material using the same FUJIFILM CORPORATION (JP) 2007-07-03 US disclosed
US-7172857-B2 Image forming photosensitive silver halide, a nonphotosensitive organic silver salt, reducing agent, and binder; shell-core polymer on support; storage stability; adhesion resistance, photography FUJIFILM CORPORATION (JP) 2007-02-06 US disclosed
US-7166408-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-01-23 US disclosed
US-7157218-B2 Suppressed fogging and printout and is excellent in storage stability of an image against stain FUJIFILM CORPORATION (JP) 2007-01-02 US disclosed
US-7157217-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2007-01-02 US disclosed
US-20060292503-A1 Photothermographic material and image forming method FUJI PHOTO FILM CO., LTD. 2006-12-28 US disclosed
US-20060210933-A1 Image forming photosensitive silver halide, a nonphotosensitive organic silver salt, reducing agent, and binder; shell-core polymer on support; storage stability; adhesion resistance, photography FUJI PHOTO FILM CO., LTD. 2006-09-21 US disclosed
US-20060073429-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2006-04-06 US disclosed
US-20050260529-A1 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2005-11-24 US disclosed
US-20050019712-A1 Silver halide emulsion, method of preparing the same and silver halide photosensitive material using the same FUJI PHOTO FILM CO., LTD. 2005-01-27 US disclosed
US-6787295-B1 GRINIDNG FUJI PHOTO FILM CO., LTD. (JP) 2004-09-07 US disclosed
US-20040161714-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-08-19 US disclosed
US-20040126717-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-07-01 US disclosed
EP-1434086-A2 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2004-06-30 EP disclosed
US-6413706-B1 HIGH PRESSURE HOMOGENIZING FUJI PHOTO FILM CO., LTD. (JP) 2002-07-02 US disclosed