Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | SHBG | P04278 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4889848 | 0.89 | TSHR (0.45) | TSHREPHX2SHBG | |
| SCHEMBL5421 | 0.86 | — | — | |
| SCHEMBL4881982 | 0.81 | — | — | |
| SCHEMBL4892956 | 0.80 | TSHR (0.39) | TSHREPHX2SHBG | |
| SCHEMBL10188556 | 0.75 | EPHX2 (0.40) | TSHREPHX2SHBG | |
| SCHEMBL1058051 | 0.75 | EPHX2 (0.40) | TSHREPHX2SHBG | |
| SCHEMBL13949108 | 0.75 | EPHX2 (0.40) | TSHREPHX2SHBG | |
| SCHEMBL13806124 | 0.75 | LMNA (0.37) | TSHRSHBG | |
| SCHEMBL6730278 | 0.75 | LMNA (0.37) | TSHRSHBG | |
| SCHEMBL8486246 | 0.75 | LMNA (0.37) | TSHRSHBG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101003591-B | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL CO | 2011-08-17 | — | — | CN | disclosed |
| US-20080220369-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080187859-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-20080026314-A1 | Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-01-31 | — | — | US | disclosed |
| US-20070269735-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-7297461-B2 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| CN-101003591-A | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2007-07-25 | — | — | CN | disclosed |
| EP-1736829-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1726608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-11-29 | — | — | EP | disclosed |
| EP-1720064-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| US-6835527-B2 | Lithography; forming semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-12-28 | — | — | US | disclosed |
| CN-1173232-C | Chemical enlargement type positive photoetching gum compositions | ס�ѻ�ѧ��ҵ��ʽ���� | 2004-10-27 | — | — | CN | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| EP-1143299-B1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2003-07-16 | — | — | EP | disclosed |
| US-20030039918-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-02-27 | — | — | US | disclosed |
| US-20020155378-A1 | Chemical amplifying type positive resist compositions | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |
| US-6406830-B2 | BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-18 | — | — | US | disclosed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |
| CN-1299079-A | Chemical enlargement type positive photoetching gum compositions | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | CN | disclosed |