Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | SHBG | P04278 | 1/20 | 0.31 |
| ▸ | NOS2 | P35228 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4882677 | 0.89 | TSHR (0.39) | TSHREPHX2SHBG | |
| SCHEMBL4892135 | 0.84 | TSHR (0.45) | TSHRESR2RECQLSHBGNOS2 | |
| SCHEMBL4389 | 0.83 | — | — | |
| SCHEMBL4893287 | 0.79 | TSHR (0.38) | TSHRNOS2 | |
| SCHEMBL269368 | 0.76 | — | — | |
| SCHEMBL1115888 | 0.76 | — | — | |
| SCHEMBL3098068 | 0.76 | — | — | |
| SCHEMBL13888940 | 0.76 | — | — | |
| SCHEMBL3098062 | 0.76 | — | — | |
| SCHEMBL5421 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080187859-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-20080026314-A1 | Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-01-31 | — | — | US | disclosed |
| US-20070269735-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-7297461-B2 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1736829-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1726608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-11-29 | — | — | EP | disclosed |
| EP-1720064-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20060223001-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1679314-A1 | SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |