⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19696572 | 1.00 | — | — | |
| SCHEMBL5176320 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL27976199 | 0.98 | SMN1; SMN2 (0.41) | — | |
| SCHEMBL14642043 | 0.87 | SMN1; SMN2 (0.46) | — | |
| SCHEMBL22187119 | 0.87 | SMN1; SMN2 (0.46) | — | |
| SCHEMBL868776 | 0.86 | APEX1 (0.45) | — | |
| SCHEMBL679131 | 0.85 | ALDH1A1 (0.46) | — | |
| SCHEMBL679130 | 0.85 | ALDH1A1 (0.46) | — | |
| SCHEMBL11306763 | 0.85 | ALDH1A1 (0.46) | — | |
| SCHEMBL17197801 | 0.85 | CNR2 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1951686-B1 | QUINAZOLINE DERIVATIVES AS A MULTIPLEX INHIBITOR AND METHOD FOR THE PREPARATION THEREOF | HANMI PHARM IND CO LTD (KR) | 2013-04-03 | — | — | EP | claimed |
| EP-3773929-B1 | METHOD FOR PRODUCING AN ENTADA SEED EXTRACT ENRICHED WITH METABOLITES OF INTEREST, EXTRACT PRODUCED BY SUCH A METHOD, AND COSMETIC AND DERMOCOSMETIC APPLICATIONS OF SUCH AN EXTRACT | EXSYMOL SA (MC) | 2022-06-08 | — | — | EP | disclosed |
| WO-2019205255-A1 | USE OF SULFATED HEPARIN DISACCHARIDE-GRAFTED POLYMETHYLACRYLOYL ETHANOLAMINE | 江南大学 (CN) | 2019-10-31 | — | — | WO | disclosed |
| WO-2019205256-A1 | SULFATED HEPARIN DISACCHARIDE-GRAFTED POLYMETHYLACRYLOYL ETHANOLAMINE AND PREPARATION METHOD THEREOF | 江南大学 (CN) | 2019-10-31 | — | — | WO | disclosed |
| CN-106287020-A | There is the flexible pipe of multiple structure | 赢创德固赛有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-103172809-B | The method manufacturing graft copolymer | 固特异轮胎和橡胶公司 | 2016-08-24 | — | — | CN | disclosed |
| CN-103554045-B | The 1,3,5-triazine carbamate containing vinyl, methylacryloyl or acryloyl group of radiation-hardenable and 1,3,5-triazine urea | 巴斯夫欧洲公司 | 2016-08-17 | — | — | CN | disclosed |
| US-20080319104-A1 | Hardening Dental Materials Featuring Adjustable Translucence | IVOCLAR VIVADENT AG (LI) | 2008-12-25 | — | — | US | disclosed |
| EP-1281516-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2007-12-19 | — | — | EP | disclosed |
| EP-1602481-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2007-05-30 | — | — | EP | disclosed |
| US-6455224-B1 | SUPPORT WITH HYDROPHILIC SURFACE AND PHOTOSENSITIVE LAYER CONTAINING INFRARED ABSORBENT WHICH CHANGES FROM HYDROPHILIC TO HYDROPHOBIC BY HEAT AND HYDROPHILIC POLYMER HAVING FUNCTIONAL GROUP RENDERING LAYER WATER DEVELOPABLE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-24 | — | — | US | disclosed |
| US-20020068241-A1 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2002-06-06 | — | — | US | disclosed |
| EP-1203659-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-05-08 | — | — | EP | disclosed |
| EP-1136281-A1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |
| EP-1048457-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1031414-A1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-0859284-A1 | Water-developable photosensitive composition and production process thereof | Nippon Paint Co., Ltd. (JP) | 1998-08-19 | — | — | EP | disclosed |
| US-5736298-A | COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-04-07 | — | — | US | disclosed |
| US-5731127-A | WEAR RESISTANCE, SOLVENT RESISTANCE | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0737896-A2 | Photosensitive composition and photosensitive planographic printing plate | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1996-10-16 | — | — | EP | disclosed |