SCHEMBL488958

SCHEMBL488958

CC(C)=C(C)C(=O)OC(CO)CCCO

nearest known ligand 0.33

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.33
MAPK1 P28482 1/20 0.33
PRKCA P17252 3/20 0.31
FAAH O00519 1/20 0.30
ALDH1A1 P00352 1/20 0.30
HPGD P15428 1/20 0.30
CNR1 P21554 1/20 0.30
CNR2 P34972 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1562506 0.84 MAPT (0.39) MAPTMAPK1PRKCAFAAHALDH1A1
SCHEMBL1566754 0.81 TSHR (0.37) MAPTMAPK1PRKCAALDH1A1
SCHEMBL1660554 0.80 MAPT (0.33) MAPTMAPK1PRKCA
SCHEMBL10400547 0.79 PRKCA (0.31) PRKCA
SCHEMBL15015717 0.74 MAPT (0.34) MAPTMAPK1PRKCAFAAH
SCHEMBL20970191 0.74 MAPT (0.34) MAPTMAPK1PRKCAFAAH
SCHEMBL22092069 0.74 MAPT (0.34) MAPTMAPK1PRKCAFAAH
SCHEMBL14648260 0.74 MAPT (0.34) MAPTMAPK1PRKCAFAAH
SCHEMBL1759349 0.73 TSHR (0.39) ALDH1A1
SCHEMBL28844447 0.73 TGFBR1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0351943-A2 Process for producing solid resilient polymer particles with open pores Advanced Polymer Systems, Inc. (US) 1990-01-24 EP claimed
US-4873091-A Controlled release formulating employing resilient microbeads ADVANCED POLYMER SYSTEMS, INC. (US) 1989-10-10 US claimed
US-20230321894-A1 METHOD OF PRODUCING CURVED MEMBER AND POLYCARBONATE RESIN LAMINATE WITH HARD COAT LAYER FOR HEAT BENDING TEIJIN LIMITED (JP) 2023-10-12 US disclosed
EP-3591014-B1 LIQUID COMPOSITION FOR INKJET AND INKJET RECORDING METHOD FUJIFILM CORP (JP) 2023-08-16 EP disclosed
US-11718095-B2 Flow channel member, liquid ejecting head, liquid ejecting apparatus, and method for manufacturing liquid ejecting apparatus SEIKO EPSON CORPORATION (JP) 2023-08-08 US disclosed
US-20220203684-A1 FLOW CHANNEL MEMBER, LIQUID EJECTING HEAD, LIQUID EJECTING APPARATUS, AND METHOD FOR MANUFACTURING LIQUID EJECTING APPARATUS SEIKO EPSON CORPORATION (JP) 2022-06-30 US disclosed
US-11193028-B2 Active-energy-ray-curable composition, active-energy-ray-curable ink, composition stored container, two-dimensional or three-dimensional image forming method, two-dimensional or three-dimensional image forming apparatus, and processed product RICOH COMPANY, LTD (JP) 2021-12-07 US disclosed
EP-3234035-B1 RADIATION CURABLE COMPOSITION COMPRISING HYDROPHILIC NANOPARTICLES BASF COATINGS GMBH (DE) 2021-06-02 EP disclosed
US-10953657-B2 Ink jet printing apparatus and printing head SEIKO EPSON CORPORATION 2021-03-23 US disclosed
US-10883010-B2 Ink jet liquid composition and ink jet recording method FUJIFILM CORPORATION (JP) 2021-01-05 US disclosed
EP-2875070-B1 RADIATION CURABLE COMPOSITION FOR WATER SCAVENGING LAYER, AND METHOD OF MANUFACTURING THE SAME BASF COATINGS GMBH (DE) 2020-09-09 EP disclosed
EP-1424689-A1 Magnetic recording medium FUJI PHOTO FILM CO., LTD. (JP) 2004-06-02 EP disclosed
US-20030224213-A1 Magnetic recording medium FUJI PHOTO FILM CO., LTD. 2003-12-04 US disclosed
US-20030148128-A1 Magnetic recording medium FUJI PHOTO FILM CO., LTD. 2003-08-07 US disclosed
US-5569717-A Composition based on propylene polymer process for obtaining it and its use Solvay (Soci et e Anonyme) (BE) 1996-10-29 US disclosed
EP-0351943-B1 PROCESS FOR PRODUCING SOLID RESILIENT POLYMER PARTICLES WITH OPEN PORES Advanced Polymer Systems, Inc. (US) 1992-12-30 EP disclosed
US-5156843-A Solid particles dispersed in woven and non-woven fabrics ADVANCED POLYMER SYSTEMS, INC. (US) 1992-10-20 US disclosed
EP-0388718-A2 Fabric impregnated with functional substances for controlled release Advanced Polymer Systems, Inc. (US) 1990-09-26 EP disclosed
EP-0351943-A2 Process for producing solid resilient polymer particles with open pores Advanced Polymer Systems, Inc. (US) 1990-01-24 EP disclosed
US-4873091-A Controlled release formulating employing resilient microbeads ADVANCED POLYMER SYSTEMS, INC. (US) 1989-10-10 US disclosed