⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1444968 | 0.88 | SMN1; SMN2 (0.52) | — | |
| SCHEMBL3992943 | 0.86 | ALDH1A1 (0.52) | — | |
| SCHEMBL223785 | 0.82 | — | — | |
| SCHEMBL8019136 | 0.79 | SMN1; SMN2 (0.42) | — | |
| SCHEMBL4325293 | 0.78 | — | — | |
| SCHEMBL15109895 | 0.77 | TSHR (0.61) | — | |
| SCHEMBL27780758 | 0.74 | TSHR (0.63) | — | |
| SCHEMBL125381 | 0.73 | — | — | |
| SCHEMBL22518658 | 0.72 | SMN1; SMN2 (0.48) | — | |
| SCHEMBL22518659 | 0.72 | SMN1; SMN2 (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 390 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0372020-B1 | PROCESS FOR COATING POLYMER SURFACES AND COATED PRODUCTS PRODUCED USING SUCH PROCESS | BRISTOL MYERS CO (US) | 1998-08-26 | — | — | EP | claimed |
| US-5645752-A | Thixotropic magnetorheological materials | LORD CORPORATION (US) | 1997-07-08 | — | — | US | claimed |
| EP-0667029-A1 | THIXOTROPIC MAGNETORHEOLOGICAL MATERIALS | LORD CORPORATION (US) | 1995-08-16 | — | — | EP | claimed |
| EP-0667029-A4 | THIXOTROPIC MAGNETORHEOLOGICAL MATERIALS. | LORD CORP (US) | 1995-06-13 | — | — | EP | claimed |
| WO-1994010693-A1 | THIXOTROPIC MAGNETORHEOLOGICAL MATERIALS | LORD CORPORATION (US) | 1994-05-11 | — | — | WO | claimed |
| US-4004927-A | Photographic light-sensitive material containing liquid organopolysiloxane | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-25 | — | — | US | claimed |
| US-20240240040-A1 | INK JET RECORDING INK AND INK JET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-4400552-A1 | ACTIVE ENERGY RAY-CURABLE INKJET INK AND IMAGE RECORDING METHOD | FUJIFILM Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| EP-3578375-B1 | MANUFACTURING METHOD OF LAMINATE PRINTED ARTICLE | FUJIFILM CORP (JP) | 2024-07-17 | — | — | EP | disclosed |
| US-20240224409-A1 | ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-4389834-A1 | ACTIVE-ENERGY-RAY-CURABLE INK, INK SET, AND IMAGE RECORDING METHOD | FUJIFILM Corporation (JP) | 2024-06-26 | — | — | EP | disclosed |
| WO-2024128086-A1 | CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | 富士フイルム株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-20240206077-A1 | MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-0490302-B1 | Silver halide photographic materials | FUJI PHOTO FILM CO LTD (JP) | 1995-03-08 | — | — | EP | disclosed |
| WO-1995004121-A1 | HIGH STRENGTH, LOW CONDUCTIVITY ELECTRORHEOLOGICAL MATERIALS | LORD CORPORATION (US) | 1995-02-09 | — | — | WO | disclosed |
| WO-1994005749-A1 | HIGH STRENGTH, LOW CONDUCTIVITY ELECTRORHEOLOGICAL MATERIALS | LORD CORPORATION (US) | 1994-03-17 | — | — | WO | disclosed |
| US-5208139-A | Lubricant | FUJI PHOTO FILM CO., LTD. (JP) | 1993-05-04 | — | — | US | disclosed |
| EP-0490302-A2 | Silver halide photographic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1992-06-17 | — | — | EP | disclosed |
| US-4675278-A | ANTISTATIC PROTECTIVE LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 1987-06-23 | — | — | US | disclosed |
| US-4004927-A | Photographic light-sensitive material containing liquid organopolysiloxane | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-25 | — | — | US | disclosed |