Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5604169 | 0.82 | HTR6 (0.35) | HTR6 | |
| SCHEMBL16338744 | 0.79 | HTR6 (0.36) | HTR6 | |
| SCHEMBL11145088 | 0.75 | — | — | |
| SCHEMBL28045452 | 0.72 | — | — | |
| SCHEMBL2122765 | 0.72 | — | — | |
| SCHEMBL6498117 | 0.68 | — | — | |
| SCHEMBL28126358 | 0.67 | — | — | |
| SCHEMBL28126357 | 0.67 | — | — | |
| SCHEMBL6497810 | 0.67 | MEN1 (0.32) | — | |
| SCHEMBL1138718 | 0.67 | HTR6 (0.46) | HTR6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-6887647-B2 | Negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-6773862-B2 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-10 | — | — | US | disclosed |
| US-20030165772-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2003-09-04 | — | — | US | disclosed |
| US-20030124456-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-03 | — | — | US | disclosed |
| US-20030054287-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2003-03-20 | — | — | US | disclosed |