SCHEMBL4891671

SCHEMBL4891671

C=C(C)C(=O)O[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.48

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.48
TSHR P16473 3/20 0.38
THRB P10828 1/20 0.35
TDP1 Q9NUW8 2/20 0.35
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3851058 0.79 ALDH1A1 (0.48) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL29161121 0.78 ALDH1A1 (0.52) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL3446620 0.78 ALDH1A1 (0.52) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL139709 0.78 ALDH1A1 (0.52) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL21399428 0.77
SCHEMBL14518186 0.76 ALDH1A1 (0.50) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL3449037 0.75 ALDH1A1 (0.55) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL7942508 0.74 ALDH1A1 (0.48) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL3400820 0.74 ALDH1A1 (0.48) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL9715045 0.73 ALDH1A1 (0.42) ALDH1A1TSHRTHRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed